Inventor

SHIRAKO KENJI

JP13 patents

⚠️ This page may combine multiple inventors who share the name “SHIRAKO KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOKUSAI ELECTRIC CORP

6 patents

US10590531B1Mar 17, 2020

Substrate processing apparatus, and method of manufacturing semiconductor device

KOKUSAI ELECTRIC CORP338 citations98

US11124873B2Sep 21, 2021

Substrate processing apparatus

KOKUSAI ELECTRIC CORP4 citations73

US11935762B2Mar 19, 2024

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

KOKUSAI ELECTRIC CORP3 citations72

US11450536B2Sep 20, 2022

Substrate processing apparatus and method of manufacturing semiconductor device

KOKUSAI ELECTRIC CORP2 citations71

US12518981B2Jan 6, 2026

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

KOKUSAI ELECTRIC CORP0 citations60

US12489010B2Dec 2, 2025

Substrate processing apparatus and method of manufacturing semiconductor device

KOKUSAI ELECTRIC CORP0 citations51

HITACHI INT ELECTRIC INC

2 patents

US10550468B2Feb 4, 2020

Substrate processing apparatus

HITACHI INT ELECTRIC INC4 citations73

US10837112B2Nov 17, 2020

Substrate processing apparatus

HITACHI INT ELECTRIC INC0 citations40

SUGIURA SHINOBU

1 patent

US9418881B2Aug 16, 2016

Substrate processing apparatus capable of switching control mode of heater

SUGIURA SHINOBU9 citations79

FUKUDA MASANAO

1 patent

US9074284B2Jul 7, 2015

Heat treatment apparatus

FUKUDA MASANAO7 citations78

SHIRAKO KENJI

1 patent

US9222732B2Dec 29, 2015

Substrate processing apparatus and method of manufacturing semiconductor device

SHIRAKO KENJI2 citations56

HIROCHI YUKITOMO

1 patent

US9084298B2Jul 14, 2015

Substrate processing apparatus including shielding unit for suppressing leakage of magnetic field

HIROCHI YUKITOMO1 citations45

SAIDO SHUHEI

1 patent

US8771416B2Jul 8, 2014

Substrate processing apparatus with an insulator disposed in the reaction chamber

SAIDO SHUHEI0 citations38