Inventor

LU YEN-CHENG

TW77 patents

⚠️ This page may combine multiple inventors who share the name “LU YEN-CHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LU YEN-CHENG

TAIWAN SEMICONDUCTOR MFG CO LTD

Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity

Extreme ultraviolet lithography collector contamination reduction

Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity

EUV lithography system and method with optimized throughput and stability

Extreme ultraviolet lithography system, device, and method for printing low pattern density features

Method to mitigate defect printability for ID pattern

Extreme ultraviolet lithography process and mask

Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof

Extreme ultraviolet lithography process to print low pattern density features

Extreme ultraviolet lithography process and mask

Method to mitigate defect printability for ID pattern

Extreme ultraviolet lithography system, device, and method for printing low pattern density features

Extreme ultraviolet lithography process and mask

Extreme ultraviolet lithography process

Lithography method and structure for resolution enhancement with a two-state mask

Method to define multiple layer patterns with a single exposure by charged particle beam lithography

Extreme ultraviolet lithography system, device, and method for printing low pattern density features

Method to mitigate defect printability for ID pattern

Extreme ultraviolet lithography process and mask

ARTILUX INC

Light-sensing apparatus and light-sensing method thereof

Photo-detecting apparatus with low dark current

Photo-detecting apparatus with low dark current

Photodetecting device for detecting different wavelengths

Photo-detecting apparatus with low dark current

Light-sensing apparatus and light-sensing method thereof

Photo-detecting apparatus with multi-reset mechanism

Light-sensing apparatus and light-sensing method thereof

Optical sensing apparatus

Photo-current amplification apparatus

Photodetecting device for detecting different wavelengths

Photodetecting device for detecting different wavelengths

Semiconductor device with low dark noise

TAIWAN SEMICONDUCTOR MFG

Method to define multiple layer patterns using a single exposure

Method to define multiple layer patterns with a single exposure by E-beam lithography

Multiple exposures in extreme ultraviolet lithography

Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity

Method for integrated circuit patterning

Extreme ultraviolet lithography process and mask

Lithography and mask for resolution enhancement

Extreme ultraviolet lithography process and mask

Extreme ultraviolet lithography process and mask

Extreme ultraviolet lithography process and mask

Extreme ultraviolet lithography process and mask

LU YEN-CHENG

Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same

Method for mask fabrication and repair

Extreme ultraviolet lithography process and mask

YU SHINN-SHENG

Extreme ultraviolet lithography process and mask

SHIH CHIA-TSUNG

Phase shift mask for extreme ultraviolet lithography and method of fabricating same

SUZHOU METABRAIN INTELLIGENT TECHNOLOGY CO LTD

Power-off protection method and apparatus, device, and storage medium

UNIV NAT TAIWAN

Method for controlling color contrast of a multi-wavelength light-emitting diode