Inventor

YU SHINN-SHENG

TW131 patents

⚠️ This page may combine multiple inventors who share the name “YU SHINN-SHENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YU SHINN-SHENG

TAIWAN SEMICONDUCTOR MFG

Method for integrated circuit patterning

Integrated circuit layout design

Optical proximity correction common process window maximization over varying feature pitch

Method of pitch halving

Integrated circuit layout design

Removal of line end shortening in microlithography and mask set for removal

Method to define multiple layer patterns using a single exposure

Two-dimensional scaling method for determining the overlay error and overlay process window for integrated circuits

Method of in line intra-field correction of overlay alignment

Hole printing by packing and unpacking using alternating phase-shifting masks

Collector in an extreme ultraviolet lithography system with optimal air curtain protection

Reflective mask and method of making same

Method to define multiple layer patterns with a single exposure by E-beam lithography

Multiple exposures in extreme ultraviolet lithography

Method and system for improving accuracy of critical dimension metrology

Approach to improve ellipsometer modeling accuracy for solving material optical constants N &amp; K

Defocus-invariant exposure for regular patterns

Assist feature for random, isolated, semi-dense, and other non-dense contacts

Extreme ultraviolet lithography process and mask

Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity

Method for integrated circuit patterning

Method and system for improving critical dimension uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD

Collector in an extreme ultraviolet lithography system with optimal air curtain protection

Lithography process

Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity

Method of making an extreme ultraviolet pellicle

EUV focus monitoring systems and methods

Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity

Geometric mask rule check with favorable and unfavorable zones

Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device

Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device

Method for integrated circuit patterning

Extreme ultraviolet lithography system, device, and method for printing low pattern density features

Pellicle for EUV mask and fabrication thereof

Extreme ultraviolet lithography process and mask

Method to mitigate defect printability for ID pattern

EUV mask and manufacturing method by using the same

Extreme ultraviolet lithography process and mask

Method of making an extreme ultraviolet pellicle

Extreme ultraviolet light (EUV) photomasks and fabrication methods thereof

Assist feature for a photolithographic process

Extreme ultraviolet lithography process to print low pattern density features

Extreme ultraviolet lithography process and mask

LU YEN-CHENG

Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same

Method for mask fabrication and repair

Extreme ultraviolet lithography process and mask

YU SHINN-SHENG

Extreme ultraviolet lithography process and mask

HSU PEI-CHENG

Reflective mask and method of making same

SHIH CHIA-TSUNG

Phase shift mask for extreme ultraviolet lithography and method of fabricating same

SHIEH MING-FENG

Method of fabrication of a semiconductor device having reduced pitch

Approach to improve ellipsometer modeling accuracy for solving material optical constants N & K