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Inventor
NOMURA HISASHI
JP
6 patents
⚠️ This page may combine multiple inventors who share the name “NOMURA HISASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
2 patents
US6787481B2
Sep 7, 2004
Method for manufacturing semiconductor device
HITACHI INT ELECTRIC INC
29 citations
91
US6821871B2
Nov 23, 2004
Method for manufacturing semiconductor device, substrate treatment method, and semiconductor manufacturing apparatus
HITACHI INT ELECTRIC INC
1 citations
51
CHIYODA CORP
2 patents
US7943115B2
May 17, 2011
Porous 4 group metal oxide and method for preparation thereof
CHIYODA CORP
4 citations
58
US7691781B2
Apr 6, 2010
Layered porous titanium oxide, process for producing the same, and catalyst comprising the same
CHIYODA CORP
2 citations
58
KOKUSAI ELECTRIC CO LTD
1 patent
US5960159A
Sep 28, 1999
Heat treatment of semiconductor wafers where upper heater directly heats upper wafer in its entirety and lower heater directly heats lower wafer in its entirety
KOKUSAI ELECTRIC CO LTD
37 citations
91
TAKESHIMA YUICHIRO
1 patent
US9023429B2
May 5, 2015
Method of manufacturing semiconductor device and substrate processing apparatus
TAKESHIMA YUICHIRO
4 citations
66