P

Inventor

KIM SEONG-JU

KR40 patents
⚠️ This page may combine multiple inventors who share the name “KIM SEONG-JU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOREA KUMHO PETROCHEM CO LTD

17 patents
US6268106B1Jul 31, 2001

Chemically amplified positive photoresist composition

KOREA KUMHO PETROCHEM CO LTD25 citations92
US6146810ANov 14, 2000

Resist polymer and chemical amplified resist composition containing the same

KOREA KUMHO PETROCHEM CO LTD22 citations92
US6369143B1Apr 9, 2002

Polymer for radiation-sensitive resist and resist composition containing the same

KOREA KUMHO PETROCHEM CO LTD18 citations83
US6358666B1Mar 19, 2002

Chemically amplified resist composition containing norbornane type low molecular additive

KOREA KUMHO PETROCHEM CO LTD19 citations83
US5882835AMar 16, 1999

Positive photoresist resin and chemical amplified positive photoresist composition containing the same

KOREA KUMHO PETROCHEM CO LTD18 citations83
US5665841ASep 9, 1997

Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same

KOREA KUMHO PETROCHEM CO LTD15 citations82
US6313327B1Nov 6, 2001

Carboxylic acid derivatives and their synthesis method

KOREA KUMHO PETROCHEM CO LTD15 citations81
US6210859B1Apr 3, 2001

Copolymer for the manufacture of chemical amplified photoresist and a positive photoresist composition using the same

KOREA KUMHO PETROCHEM CO LTD17 citations80
US5962185AOct 5, 1999

Polymer for positive photoresist and chemical amplified positive photoresist composition containing the same

KOREA KUMHO PETROCHEM CO LTD9 citations73
US5962186AOct 5, 1999

Polymer for chemical amplified positive photoresist composition containing the same

KOREA KUMHO PETROCHEM CO LTD12 citations73
US5723258AMar 3, 1998

Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same

KOREA KUMHO PETROCHEM CO LTD8 citations73
US5667931ASep 16, 1997

Positive photoresist composition containing quinone diazide 5-triazine esterification compound

KOREA KUMHO PETROCHEM CO LTD8 citations73
US5989775ANov 23, 1999

Copolymer useful for positive photoresist and chemical amplification positive photoresist composition comprising the same

KOREA KUMHO PETROCHEM CO LTD4 citations62
US5916995AJun 29, 1999

Acetal-substituted aromatic hydroxy compounds and negative photoresist compositions comprising the same

KOREA KUMHO PETROCHEM CO LTD6 citations62
US5677103AOct 14, 1997

Positive photoresist composition

KOREA KUMHO PETROCHEM CO LTD6 citations62
US5851728ADec 22, 1998

Three-component chemical amplified photoresist composition

KOREA KUMHO PETROCHEM CO LTD6 citations58
US6987198B2Jan 17, 2006

Acid generator and thin film composition containing the same

KOREA KUMHO PETROCHEM CO LTD0 citations45

DOOSAN HEAVY IND & CONSTRUCTION CO LTD

7 patents

HYUNDAI STEEL CO

3 patents

DREAMUS COMPANY

2 patents

SAMSUNG ELECTRONICS CO LTD

2 patents

KIM SEONG-JU

2 patents

KOREA KUMBO PETROCHEMICAL CO L

1 patent

KUMHO PETROCHEM CO LTD

1 patent

SOHN IL-RYOUNG

1 patent

JUN SEOK YUL

1 patent

CHOI YONG JOON

1 patent

KOREA KUMHO CHEMICAL CO LTD

1 patent

NTELS CO LTD

1 patent