P

Inventor

KAMIJO KOICHI

JP54 patents
⚠️ This page may combine multiple inventors who share the name “KAMIJO KOICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SEIKO EPSON CORP

19 patents
US4737018AApr 12, 1988

Display device having anti-reflective electrodes and/or insulating film

SEIKO EPSON CORP27 citations92
US8023849B2Sep 20, 2011

Image forming apparatus and image forming method

SEIKO EPSON CORP7 citations84
US7590368B2Sep 15, 2009

Image forming apparatus and method of cleaning intermediate transfer belt

SEIKO EPSON CORP13 citations84
US7177576B2Feb 13, 2007

Apparatus for forming image using liquid development

SEIKO EPSON CORP8 citations74
US7149459B2Dec 12, 2006

Application roller and image forming apparatus

SEIKO EPSON CORP10 citations74
US10044295B2Aug 7, 2018

Piezoelectric actuator and robot

SEIKO EPSON CORP2 citations73
US9666785B2May 30, 2017

Piezoelectric driving device, robot, and driving method of the same

SEIKO EPSON CORP4 citations73
US4718751AJan 12, 1988

Optical panel and method of fabrication

SEIKO EPSON CORP12 citations73
US8351832B2Jan 8, 2013

Image forming apparatus with recessed transfer roller including grippers

SEIKO EPSON CORP4 citations63
US7937016B2May 3, 2011

Transfer device and image forming apparatus including the same

SEIKO EPSON CORP6 citations63
US7561815B2Jul 14, 2009

Image forming apparatus that controls development conditions based on paper type

SEIKO EPSON CORP4 citations63
US7493065B2Feb 17, 2009

Wire bar, method of manufacturing wire bar, and image forming apparatus

SEIKO EPSON CORP2 citations63
US7844203B2Nov 30, 2010

Development apparatus and image forming apparatus using the same

SEIKO EPSON CORP3 citations62
US10249811B2Apr 2, 2019

Piezoelectric driving device, robot, and driving method of the same

SEIKO EPSON CORP0 citations52
US9331263B2May 3, 2016

Piezoelectric motor, drive unit, electronic part transfer apparatus, electronic part inspection apparatus, robot, and printer

SEIKO EPSON CORP0 citations52
US8810109B2Aug 19, 2014

Piezoelectric actuator, motor, robot hand, and robot

SEIKO EPSON CORP0 citations52
US7672619B2Mar 2, 2010

Wire bar, method of manufacturing wire bar, and image forming apparatus

SEIKO EPSON CORP0 citations52
US9391257B2Jul 12, 2016

Actuator, robot hand, robot, electronic component carrying device, electronic component inspection device, and printer

SEIKO EPSON CORP0 citations42
US8036566B2Oct 11, 2011

Control method of image forming apparatus and image forming apparatus

SEIKO EPSON CORP0 citations42

NIKON CORP

13 patents
US6815693B2Nov 9, 2004

Charged-particle-beam microlithography apparatus and methods including proximity-effect correction

NIKON CORP38 citations92
US6501083B1Dec 31, 2002

Methods for calculating cumulative dose of exposure energy from regions of a microlithography reticle for use in correcting proximity effects

NIKON CORP30 citations92
US6507027B1Jan 14, 2003

Apparatus and methods for charged-particle-beam microlithography exhibiting reduced four-fold aberrations

NIKON CORP15 citations84
US6830852B2Dec 14, 2004

Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticles

NIKON CORP7 citations74
US6194102B1Feb 27, 2001

Pattern-transfer methods and masks

NIKON CORP9 citations74
US6654106B2Nov 25, 2003

Methods and apparatus for determining blur of an optical system

NIKON CORP2 citations63
US6642532B2Nov 4, 2003

Methods for determining a pattern on a microlithography reticle to minimize proximity effects in pattern elements in chips located on substrate periphery

NIKON CORP4 citations63
US6566663B1May 20, 2003

Charged-particle-beam optical components and systems including ferrite exhibiting reduced image displacement from temperature fluctuations

NIKON CORP6 citations63
US6531251B2Mar 11, 2003

Proximity effect correction methods

NIKON CORP2 citations63
US6489620B1Dec 3, 2002

Astigmatism-correction device and charged-particle-beam microlithography apparatus and methods comprising same

NIKON CORP2 citations63
US6432594B1Aug 13, 2002

Devices for reducing deflection aberrations in charged-particle-beam optical systems and microlithography apparatus comprising same, and related methods

NIKON CORP4 citations63
US6255663B1Jul 3, 2001

Charged particle beam exposure apparatus and semiconductor device manufacturing method

NIKON CORP3 citations63
US6635881B2Oct 21, 2003

Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same

NIKON CORP4 citations62

IBM

10 patents

KAMIJO KOICHI

4 patents

TANAKA SHINICHI

2 patents

SEIKO EPSON CORP A JAPANESE CO

1 patent

CHIBA SATOSHI

1 patent

Showing the top 50 of 54 patents by PatentIndex Score.