P

Inventor

JOCHEMSEN MARINUS

NL26 patents
⚠️ This page may combine multiple inventors who share the name “JOCHEMSEN MARINUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASML NETHERLANDS BV

24 patents
US11067902B2Jul 20, 2021

Computational metrology

ASML NETHERLANDS BV9 citations85
US10712672B2Jul 14, 2020

Method of predicting patterning defects caused by overlay error

ASML NETHERLANDS BV7 citations84
US10859926B2Dec 8, 2020

Methods for defect validation

ASML NETHERLANDS BV7 citations79
US11681229B2Jun 20, 2023

Selection of measurement locations for patterning processes

ASML NETHERLANDS BV1 citations73
US11443083B2Sep 13, 2022

Identification of hot spots or defects by machine learning

ASML NETHERLANDS BV2 citations73
US10962886B2Mar 30, 2021

Selection of measurement locations for patterning processes

ASML NETHERLANDS BV1 citations73
US10394136B2Aug 27, 2019

Metrology method for process window definition

ASML NETHERLANDS BV2 citations73
US10852646B2Dec 1, 2020

Displacement based overlay or alignment

ASML NETHERLANDS BV2 citations72
US11768442B2Sep 26, 2023

Method of determining control parameters of a device manufacturing process

ASML NETHERLANDS BV1 citations71
US11513442B2Nov 29, 2022

Method of determining control parameters of a device manufacturing process

ASML NETHERLANDS BV2 citations71
US12461451B2Nov 4, 2025

Computational metrology

ASML NETHERLANDS BV0 citations62
US12360461B2Jul 15, 2025

Identification of hot spots or defects by machine learning

ASML NETHERLANDS BV0 citations62
US12228862B2Feb 18, 2025

Selection of measurement locations for patterning processes

ASML NETHERLANDS BV0 citations62
US11520239B2Dec 6, 2022

Separation of contributions to metrology data

ASML NETHERLANDS BV1 citations62
US12197136B2Jan 14, 2025

Method of determining control parameters of a device manufacturing process

ASML NETHERLANDS BV0 citations61
US11314174B2Apr 26, 2022

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

ASML NETHERLANDS BV1 citations60
US11442367B2Sep 13, 2022

Optimizing a sequence of processes for manufacturing of product units

ASML NETHERLANDS BV0 citations59
US11106141B2Aug 31, 2021

Optimizing a sequence of processes for manufacturing of product units

ASML NETHERLANDS BV1 citations59
US11048174B2Jun 29, 2021

Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer program

ASML NETHERLANDS BV1 citations56
US9964865B2May 8, 2018

Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus

ASML NETHERLANDS BV0 citations51
US12468234B2Nov 11, 2025

Method of controlling a patterning process, device manufacturing method

ASML NETHERLANDS BV0 citations49
US11300887B2Apr 12, 2022

Method to change an etch parameter

ASML NETHERLANDS BV0 citations49
US10725372B2Jul 28, 2020

Method and apparatus for reticle optimization

ASML NETHERLANDS BV0 citations49
US10459345B2Oct 29, 2019

Focus-dose co-optimization based on overlapping process window

ASML NETHERLANDS BV0 citations34

GROUWSTRA CÉDRIC DÉSIRÉ

1 patent

STAVENGA MARCO KOERT

1 patent