Inventor

YANG DA

US30 patents

⚠️ This page may combine multiple inventors who share the name “YANG DA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YANG DA

QUALCOMM INC

Semiconductor device having a gap defined therein

Contact wrap around structure

Self-aligned structure

Metal-oxide semiconductor (MOS) standard cells employing electrically coupled source regions and supply rails to relax source-drain tip-to-tip spacing between adjacent MOS standard cells

Standard cell circuits employing high aspect ratio voltage rails for reduced resistance

Vertically stacked nanowire field effect transistors

Nanowire channel structures of continuously stacked nanowires for complementary metal oxide semiconductor (CMOS) devices

Minimum track standard cell circuits for reduced area

Middle-of-line integration methods and semiconductor devices

Middle-of-line (MOL) manufactured integrated circuits (ICs) employing local interconnects of metal lines using an elongated via, and related methods

Cell circuits formed in circuit cells employing offset gate cut areas in a non-active area for routing transistor gate cross-connections

Circuits having a diffusion break with avoided or reduced adjacent semiconductor channel strain relaxation, and related methods

Circuits having a diffusion break with avoided or reduced adjacent semiconductor channel strain relaxation, and related methods

Layout effect mitigation in FinFET

Semiconductor device having a gap defined therein

Method for mitigating layout effect in FINFET

Electron-beam (E-beam) based semiconductor device features

Combining cut mask lithography and conventional lithography to achieve sub-threshold pattern features

Semiconductor device having high mobility channel

Self-aligned quadruple patterning process for Fin pitch below 20nm

Integrated circuits having reduced dimensions between components

CHENG JOY

Method of forming sub-lithographic features using directed self-assembly of polymers

Method for designing optical lithography masks for directed self-assembly

Method for designing optical lithography masks for directed self-assembly

FOSHAN KEZHIMEI FURNITURE CO LTD

Chair base

Chair backrest

INST OF MICROELECTRONICS CAS

Method for manufacturing semiconductor structure through forming an additional layer inside opening of a photoresist layer

YIN HAIZHOU

Method for manufacturing a semiconductor device

ZHONG HUICAI

MOS transistor and method for forming the same

UNIV OF PITTSBURGH—OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION

Targeting cancer-associated long non-coding RNAs