Inventor
WANG TZU YI
TW16 patents
⚠️ This page may combine multiple inventors who share the name “WANG TZU YI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
14 patentsUS11237477B2Feb 1, 2022
Reticle container
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11106126B2Aug 31, 2021
Method of manufacturing EUV photo masks
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US12153351B2Nov 26, 2024
Enhancing lithography operation for manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations70
US11829076B2Nov 28, 2023
Enhancing lithography operation for manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations70
US11550229B1Jan 10, 2023
Enhancing lithography operation for manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US11048158B2Jun 29, 2021
Method for extreme ultraviolet lithography mask treatment
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations70
US12487519B2Dec 2, 2025
Reticle container
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12085843B2Sep 10, 2024
Method of manufacturing EUV photo masks
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11789356B2Oct 17, 2023
Method of manufacturing EUV photo masks
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11119398B2Sep 14, 2021
EUV photo masks
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11906897B2Feb 20, 2024
Method for extreme ultraviolet lithography mask treatment
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12092952B2Sep 17, 2024
Methods for forming extreme ultraviolet mask comprising magnetic material
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US12578640B2Mar 17, 2026
Photosensitive material for photoresist and lithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US11249384B2Feb 15, 2022
Mask for EUV lithography and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47