Inventor
SAITOU NORIO
JP31 patents
⚠️ This page may combine multiple inventors who share the name “SAITOU NORIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
22 patentsUS6159644ADec 12, 2000
Method of fabricating semiconductor circuit devices utilizing multiple exposures
HITACHI LTD100 citations98
US5420436AMay 30, 1995
Methods for measuring optical system, and method and apparatus for exposure using said measuring method
HITACHI LTD61 citations94
US5283440AFeb 1, 1994
Electron beam writing system used in a cell projection method
HITACHI LTD34 citations93
US6667486B2Dec 23, 2003
Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same
HITACHI LTD34 citations92
US6511048B1Jan 28, 2003
Electron beam lithography apparatus and pattern forming method
HITACHI LTD20 citations92
US5757409AMay 26, 1998
Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus
HITACHI LTD25 citations92
US5650631AJul 22, 1997
Electron beam writing system
HITACHI LTD22 citations92
US5557314ASep 17, 1996
Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus
HITACHI LTD20 citations92
US5162240ANov 10, 1992
Method and apparatus of fabricating electric circuit pattern on thick and thin film hybrid multilayer wiring substrate
HITACHI LTD47 citations92
US4740698AApr 26, 1988
Hybrid charged particle apparatus
HITACHI LTD32 citations92
US4820928AApr 11, 1989
Lithography apparatus
HITACHI LTD33 citations90
US4692579ASep 8, 1987
Electron beam lithography apparatus
HITACHI LTD21 citations81
US6768118B2Jul 27, 2004
Electron beam monitoring sensor and electron beam monitoring method
HITACHI LTD8 citations74
US5311026AMay 10, 1994
Charged particle beam lithography system and method therefor
HITACHI LTD9 citations74
US4396901AAug 2, 1983
Method for correcting deflection distortion in an apparatus for charged particle lithography
HITACHI LTD11 citations74
US5759423AJun 2, 1998
Electron beam writing method and apparatus for carrying out the same
HITACHI LTD9 citations73
US4943729AJul 24, 1990
Electron beam lithography system
HITACHI LTD15 citations73
US4829444AMay 9, 1989
Charged particle beam lithography system
HITACHI LTD9 citations73
US4701620AOct 20, 1987
Electron beam exposure apparatus
HITACHI LTD10 citations73
US4577111AMar 18, 1986
Apparatus for electron beam lithography
HITACHI LTD12 citations73
US4489241ADec 18, 1984
Exposure method with electron beam exposure apparatus
HITACHI LTD12 citations72
US4445040AApr 24, 1984
Shaping aperture for a charged particle forming system
HITACHI LTD6 citations61