P

Inventor

CHO HANS S

KR48 patents
⚠️ This page may combine multiple inventors who share the name “CHO HANS S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

22 patents
US7575962B2Aug 18, 2009

Fin structure and method of manufacturing fin transistor adopting the fin structure

SAMSUNG ELECTRONICS CO LTD47 citations93
US7566364B2Jul 28, 2009

Method of fabricating orientation-controlled single-crystalline wire and method of fabricating transistor having the same

SAMSUNG ELECTRONICS CO LTD28 citations93
US7297615B2Nov 20, 2007

Si nanowire substrate, method of manufacturing the same, and method of manufacturing thin film transistor using the same

SAMSUNG ELECTRONICS CO LTD32 citations93
US7859054B2Dec 28, 2010

Poly-Si thin film transistor and organic light-emitting display having the same

SAMSUNG ELECTRONICS CO LTD9 citations84
US7611932B2Nov 3, 2009

Method of manufacturing a thin film transistor

SAMSUNG ELECTRONICS CO LTD13 citations84
US7557411B2Jul 7, 2009

Semi-conductor-on-insulator structure, semiconductor devices using the same and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD12 citations84
US7999322B2Aug 16, 2011

Poly-Si thin film transistor and organic light-emitting display having the same

SAMSUNG ELECTRONICS CO LTD6 citations74
US7642177B2Jan 5, 2010

Method of manufacturing nanowire

SAMSUNG ELECTRONICS CO LTD7 citations74
US7511381B2Mar 31, 2009

Thin film transistor and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD5 citations74
US7772711B2Aug 10, 2010

Semiconductor device including single crystal silicon layer

SAMSUNG ELECTRONICS CO LTD6 citations72
US8021936B2Sep 20, 2011

Method of manufacturing thin film transistor

SAMSUNG ELECTRONICS CO LTD3 citations63
US8022408B2Sep 20, 2011

Crystalline nanowire substrate, method of manufacturing the same, and method of manufacturing thin film transistor using the same

SAMSUNG ELECTRONICS CO LTD2 citations63
US7714330B2May 11, 2010

Si nanowire substrate

SAMSUNG ELECTRONICS CO LTD2 citations63
US7662678B2Feb 16, 2010

Method of forming a more highly-oriented silicon layer and substrate having the same

SAMSUNG ELECTRONICS CO LTD5 citations63
US7531240B2May 12, 2009

Substrate with locally integrated single crystalline silicon layer and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD3 citations63
US7750424B2Jul 6, 2010

Microlens and an image sensor including a microlens

SAMSUNG ELECTRONICS CO LTD4 citations62
US8012819B2Sep 6, 2011

Semiconductor device including gate stack formed on inclined surface and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD0 citations52
US7667300B2Feb 23, 2010

Semiconductor device including gate stack formed on inclined surface and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD0 citations52
US7629205B2Dec 8, 2009

Thin film transistor having double-layered gate electrode and method of manufacturing the thin film transistor

SAMSUNG ELECTRONICS CO LTD0 citations52
US7560317B2Jul 14, 2009

Method of forming single crystalline silicon layer, structure including the same, and method of fabricating thin film transistor using the same

SAMSUNG ELECTRONICS CO LTD0 citations52
US7439197B2Oct 21, 2008

Method of fabricating a capacitor

SAMSUNG ELECTRONICS CO LTD1 citations52
US7390706B2Jun 24, 2008

Method of forming channel region of TFT composed of single crystal Si

SAMSUNG ELECTRONICS CO LTD0 citations52

CHO HANS S

7 patents

HEWLETT PACKARD ENTPR DEV LP

7 patents

YIN HUAXIANG

4 patents

HEWLETT PACKARD DEVELOPMENT CO

2 patents

XIANYU WENXU

2 patents

WU WEI

1 patent

US GOV SEC NAVY

1 patent

PICKETT MATTHEW D

1 patent

QUITORIANO NATHANIEL J

1 patent