Inventor · disambiguated record

David Emery Haney

Also filed as: HANEY DAVID EMERY

1 granted patent·25 citations·filing 1997–1997

43Inventor score

Technology areasH01J

Files withIBM1

Top patents by PatentIndex Score

1 record

0170US6132632AMethod and apparatus for achieving etch rate uniformity in a reactive ion etcherIBM·Filed 1997·Granted Oct 17, 2000·25 cites·8 claims

Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →