Inventor

KISHIOKA TAKAHIRO

JP64 patents

⚠️ This page may combine multiple inventors who share the name “KISHIOKA TAKAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KISHIOKA TAKAHIRO

NISSAN CHEMICAL IND LTD

Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative

Condensation type polymer-containing anti-reflective coating for semiconductor

Composition for forming anti-reflective coating for use in lithography

Underlayer coating forming composition for lithography containing compound having protected carboxyl group

Composition for forming anti-reflective coating for use in lithography

Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compound

Sulfonate-containing anti-reflective coating forming composition for lithography

Method for roughening surface using wet treatment

Cell culture vessel

Film-forming composition and ion implantation method

Blood filter and method for manufacturing the same

Anti-reflective coating containing sulfur atom

Composition for forming resist underlayer film and method for forming resist pattern using same

Ion complex material having function of inhibiting adhesion of biological substance and method for manufacturing the same

Cationically polymerizable resist underlayer film-forming composition

Photosensitive fiber and method for manufacturing same

Acrylic polymer-containing gap fill material forming composition for lithography

Composition for forming anti-reflective coating for use in lithography

Method for manufacturing semiconductor device using quadruple-layer laminate

Composition for forming anti-reflective coating for use in lithography

Composition for forming anti-reflective coating for use in lithography

Bottom anti-reflective coat forming composition for lithography

Composition for forming resist underlayer film and method for forming resist pattern using same

Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain

Composition for forming anti-reflective coat

Polymer and composition including same, and adhesive composition

Fiber-forming composition and bio-compatible material using said fiber

NISSAN CHEMICAL CORP

Protective film-forming composition

Resist underlying film forming composition

Protective film forming composition having an acetal structure

Composition for forming a coating film for removing foreign matters

Photocurable resin composition containing self-crosslinkable polymer

Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method

Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer

Chemical-resistant protective film forming composition containing hydroxyaryl-terminated polymer

Protective film-forming composition having acetal structure and amide structure

Protective film forming composition having a diol structure

Composition for forming resist underlayer film

Composition for forming coating film and method for manufacturing semiconductor device

Resist underlayer film-forming composition

Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive

KISHIOKA TAKAHIRO

Monolayer or multilayer forming composition

Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound

Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound

MAEDA SHINICHI

Forming agent for gate insulating film of thin film transistor

Composition for forming gate insulating film for thin-film transistor

Gate insulating film forming agent for thin-film transistor

HIROI YOSHIOMI

Composition containing hydroxylated condensation resin for forming resist underlayer film

KIMURA SHIGEO

Photosensitive resist underlayer film forming composition

HORIGUCHI YUSUKE

Composition for forming photosensitive resist underlayer film