Inventor
KELCHNER KATHRYN MERCED
US5 patents
Patents
5 patentsUS9824884B1Nov 21, 2017
Method for depositing metals free ald silicon nitride films using halide-based precursors
LAM RES CORP348 citations98
US9865455B1Jan 9, 2018
Nitride film formed by plasma-enhanced and thermal atomic layer deposition process
LAM RES CORP434 citations95
US11832533B2Nov 28, 2023
Conformal damage-free encapsulation of chalcogenide materials
LAM RES CORP0 citations60
US11239420B2Feb 1, 2022
Conformal damage-free encapsulation of chalcogenide materials
LAM RES CORP1 citations60
US10020188B2Jul 10, 2018
Method for depositing ALD films using halide-based precursors
LAM RES CORP0 citations51