Inventor
LEE MINHYUN
KR53 patents
⚠️ This page may combine multiple inventors who share the name “LEE MINHYUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
49 patentsUS10790356B2Sep 29, 2020
Semiconductor device including metal-2 dimensional material-semiconductor contact
SAMSUNG ELECTRONICS CO LTD7 citations84
US10217819B2Feb 26, 2019
Semiconductor device including metal-2 dimensional material-semiconductor contact
SAMSUNG ELECTRONICS CO LTD6 citations84
US11588034B2Feb 21, 2023
Field effect transistor including gate insulating layer formed of two-dimensional material
SAMSUNG ELECTRONICS CO LTD4 citations74
US11342414B2May 24, 2022
Semiconductor device including metal-2 dimensional material-semiconductor contact
SAMSUNG ELECTRONICS CO LTD2 citations73
US10996556B2May 4, 2021
Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pellicles
SAMSUNG ELECTRONICS CO LTD3 citations73
US10684560B2Jun 16, 2020
Pellicle for photomask, reticle including the same, and exposure apparatus for lithography
SAMSUNG ELECTRONICS CO LTD6 citations73
US10559660B2Feb 11, 2020
Semiconductor device including metal-2 dimensional material-semiconductor contact
SAMSUNG ELECTRONICS CO LTD3 citations73
US10217513B2Feb 26, 2019
Phase change memory devices including two-dimensional material and methods of operating the same
SAMSUNG ELECTRONICS CO LTD4 citations73
US9922825B2Mar 20, 2018
Electronics device having two-dimensional (2D) material layer and method of manufacturing the electronic device by inkjet printing
SAMSUNG ELECTRONICS CO LTD2 citations73
US12408399B2Sep 2, 2025
Semiconductor device including two-dimensional semiconductor material
SAMSUNG ELECTRONICS CO LTD0 citations62
US12378120B2Aug 5, 2025
Wiring including graphene layer and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US12255244B2Mar 18, 2025
Field effect transistor including gate insulating layer formed of two-dimensional material
SAMSUNG ELECTRONICS CO LTD0 citations62
US12087818B2Sep 10, 2024
Transistor including two-dimensional (2D) channel
SAMSUNG ELECTRONICS CO LTD0 citations62
US12062697B2Aug 13, 2024
Semiconductor device including two-dimensional semiconductor material
SAMSUNG ELECTRONICS CO LTD0 citations62
US12040360B2Jul 16, 2024
Semiconductor device including metal-2 dimensional material-semiconductor contact
SAMSUNG ELECTRONICS CO LTD0 citations62
US12034049B2Jul 9, 2024
Superlattice structure including two-dimensional material and device including the superlattice structure
SAMSUNG ELECTRONICS CO LTD0 citations62
US12027588B2Jul 2, 2024
Field effect transistor including channel formed of 2D material
SAMSUNG ELECTRONICS CO LTD0 citations62
US12002882B2Jun 4, 2024
Vertical type transistor, inverter including the same, and vertical type semiconductor device including the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US11703753B2Jul 18, 2023
Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pellicles
SAMSUNG ELECTRONICS CO LTD0 citations62
US11575011B2Feb 7, 2023
Superlattice structure including two-dimensional material and device including the superlattice structure
SAMSUNG ELECTRONICS CO LTD0 citations62
US11563116B2Jan 24, 2023
Vertical type transistor, inverter including the same, and vertical type semiconductor device including the same
SAMSUNG ELECTRONICS CO LTD1 citations62
US11532709B2Dec 20, 2022
Field effect transistor including channel formed of 2D material
SAMSUNG ELECTRONICS CO LTD1 citations62
US11508815B2Nov 22, 2022
Semiconductor device including two-dimensional semiconductor material
SAMSUNG ELECTRONICS CO LTD0 citations62
US11508814B2Nov 22, 2022
Transistor including two-dimensional (2D) channel
SAMSUNG ELECTRONICS CO LTD0 citations62
US11189699B2Nov 30, 2021
Superlattice structure including two-dimensional material and device including the superlattice structure
SAMSUNG ELECTRONICS CO LTD0 citations62
US10199469B2Feb 5, 2019
Semiconductor device including metal-semiconductor junction
SAMSUNG ELECTRONICS CO LTD1 citations62
US12356668B2Jul 8, 2025
Field effect transistor including channels having a hollow closed cross-sectional structure and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US12272402B2Apr 8, 2025
Vertical nonvolatile memory device including memory cell string
SAMSUNG ELECTRONICS CO LTD0 citations61
US12183679B2Dec 31, 2024
Interconnect structure and electronic apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US12142697B2Nov 12, 2024
Two-dimensional material-based wiring conductive layer contact structures, electronic devices including the same, and methods of manufacturing the electronic devices
SAMSUNG ELECTRONICS CO LTD0 citations61
US12080649B2Sep 3, 2024
Semiconductor memory device and apparatus including the same
SAMSUNG ELECTRONICS CO LTD1 citations61
US11935790B2Mar 19, 2024
Field effect transistor and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US11830952B2Nov 28, 2023
Two-dimensional material-based wiring conductive layer contact structures, electronic devices including the same, and methods of manufacturing the electronic devices
SAMSUNG ELECTRONICS CO LTD0 citations61
US11462477B2Oct 4, 2022
Interconnect structure and electronic apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US11424186B2Aug 23, 2022
Semiconductor memory device and apparatus including the same
SAMSUNG ELECTRONICS CO LTD0 citations61
US11329223B2May 10, 2022
Nonvolatile memory apparatus including resistive-change material layer
SAMSUNG ELECTRONICS CO LTD0 citations60
US11158849B2Oct 26, 2021
Lithium ion battery including nano-crystalline graphene electrode
SAMSUNG ELECTRONICS CO LTD1 citations60
US10811604B2Oct 20, 2020
Nonvolatile memory apparatus including resistive-change material layer
SAMSUNG ELECTRONICS CO LTD1 citations60
US12139814B2Nov 12, 2024
Boron nitride layer, apparatus including the same, and method of fabricating the boron nitride layer
SAMSUNG ELECTRONICS CO LTD0 citations59
US11624127B2Apr 11, 2023
Boron nitride layer, apparatus including the same, and method of fabricating the boron nitride layer
SAMSUNG ELECTRONICS CO LTD1 citations59
US11985910B2May 14, 2024
Memristor and neuromorphic device comprising the same
SAMSUNG ELECTRONICS CO LTD0 citations58
US11600774B2Mar 7, 2023
Nonvolatile memory device and operating method of the same
SAMSUNG ELECTRONICS CO LTD0 citations58
US11374171B2Jun 28, 2022
Memristor and neuromorphic device comprising the same
SAMSUNG ELECTRONICS CO LTD0 citations58
US12268106B2Apr 1, 2025
Nonvolatile memory device and operating method of the same
SAMSUNG ELECTRONICS CO LTD0 citations57
US12199129B2Jan 14, 2025
Image sensors integrated with infrared sensors and electronic devices including the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US10910794B2Feb 2, 2021
Light-emitting device comprising photonic cavity
SAMSUNG ELECTRONICS CO LTD0 citations52
US10460935B2Oct 29, 2019
Electronic device having two-dimensional (2D) material layer and method of manufacturing the electronic device by inkjet printing
SAMSUNG ELECTRONICS CO LTD0 citations52
US9515144B2Dec 6, 2016
Fin-type graphene device
SAMSUNG ELECTRONICS CO LTD0 citations52
US12484260B2Nov 25, 2025
Vertical NAND flash memory device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations49
UIF UNIV INDUSTRY FOUNDATION YONSEI UNIV
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