P

Inventor

LEE MINHYUN

KR53 patents
⚠️ This page may combine multiple inventors who share the name “LEE MINHYUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

49 patents
US10790356B2Sep 29, 2020

Semiconductor device including metal-2 dimensional material-semiconductor contact

SAMSUNG ELECTRONICS CO LTD7 citations84
US10217819B2Feb 26, 2019

Semiconductor device including metal-2 dimensional material-semiconductor contact

SAMSUNG ELECTRONICS CO LTD6 citations84
US11588034B2Feb 21, 2023

Field effect transistor including gate insulating layer formed of two-dimensional material

SAMSUNG ELECTRONICS CO LTD4 citations74
US11342414B2May 24, 2022

Semiconductor device including metal-2 dimensional material-semiconductor contact

SAMSUNG ELECTRONICS CO LTD2 citations73
US10996556B2May 4, 2021

Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pellicles

SAMSUNG ELECTRONICS CO LTD3 citations73
US10684560B2Jun 16, 2020

Pellicle for photomask, reticle including the same, and exposure apparatus for lithography

SAMSUNG ELECTRONICS CO LTD6 citations73
US10559660B2Feb 11, 2020

Semiconductor device including metal-2 dimensional material-semiconductor contact

SAMSUNG ELECTRONICS CO LTD3 citations73
US10217513B2Feb 26, 2019

Phase change memory devices including two-dimensional material and methods of operating the same

SAMSUNG ELECTRONICS CO LTD4 citations73
US9922825B2Mar 20, 2018

Electronics device having two-dimensional (2D) material layer and method of manufacturing the electronic device by inkjet printing

SAMSUNG ELECTRONICS CO LTD2 citations73
US12408399B2Sep 2, 2025

Semiconductor device including two-dimensional semiconductor material

SAMSUNG ELECTRONICS CO LTD0 citations62
US12378120B2Aug 5, 2025

Wiring including graphene layer and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US12255244B2Mar 18, 2025

Field effect transistor including gate insulating layer formed of two-dimensional material

SAMSUNG ELECTRONICS CO LTD0 citations62
US12087818B2Sep 10, 2024

Transistor including two-dimensional (2D) channel

SAMSUNG ELECTRONICS CO LTD0 citations62
US12062697B2Aug 13, 2024

Semiconductor device including two-dimensional semiconductor material

SAMSUNG ELECTRONICS CO LTD0 citations62
US12040360B2Jul 16, 2024

Semiconductor device including metal-2 dimensional material-semiconductor contact

SAMSUNG ELECTRONICS CO LTD0 citations62
US12034049B2Jul 9, 2024

Superlattice structure including two-dimensional material and device including the superlattice structure

SAMSUNG ELECTRONICS CO LTD0 citations62
US12027588B2Jul 2, 2024

Field effect transistor including channel formed of 2D material

SAMSUNG ELECTRONICS CO LTD0 citations62
US12002882B2Jun 4, 2024

Vertical type transistor, inverter including the same, and vertical type semiconductor device including the same

SAMSUNG ELECTRONICS CO LTD0 citations62
US11703753B2Jul 18, 2023

Pellicles for photomasks, reticles including the photomasks, and methods of manufacturing the pellicles

SAMSUNG ELECTRONICS CO LTD0 citations62
US11575011B2Feb 7, 2023

Superlattice structure including two-dimensional material and device including the superlattice structure

SAMSUNG ELECTRONICS CO LTD0 citations62
US11563116B2Jan 24, 2023

Vertical type transistor, inverter including the same, and vertical type semiconductor device including the same

SAMSUNG ELECTRONICS CO LTD1 citations62
US11532709B2Dec 20, 2022

Field effect transistor including channel formed of 2D material

SAMSUNG ELECTRONICS CO LTD1 citations62
US11508815B2Nov 22, 2022

Semiconductor device including two-dimensional semiconductor material

SAMSUNG ELECTRONICS CO LTD0 citations62
US11508814B2Nov 22, 2022

Transistor including two-dimensional (2D) channel

SAMSUNG ELECTRONICS CO LTD0 citations62
US11189699B2Nov 30, 2021

Superlattice structure including two-dimensional material and device including the superlattice structure

SAMSUNG ELECTRONICS CO LTD0 citations62
US10199469B2Feb 5, 2019

Semiconductor device including metal-semiconductor junction

SAMSUNG ELECTRONICS CO LTD1 citations62
US12356668B2Jul 8, 2025

Field effect transistor including channels having a hollow closed cross-sectional structure and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations61
US12272402B2Apr 8, 2025

Vertical nonvolatile memory device including memory cell string

SAMSUNG ELECTRONICS CO LTD0 citations61
US12183679B2Dec 31, 2024

Interconnect structure and electronic apparatus including the same

SAMSUNG ELECTRONICS CO LTD0 citations61
US12142697B2Nov 12, 2024

Two-dimensional material-based wiring conductive layer contact structures, electronic devices including the same, and methods of manufacturing the electronic devices

SAMSUNG ELECTRONICS CO LTD0 citations61
US12080649B2Sep 3, 2024

Semiconductor memory device and apparatus including the same

SAMSUNG ELECTRONICS CO LTD1 citations61
US11935790B2Mar 19, 2024

Field effect transistor and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations61
US11830952B2Nov 28, 2023

Two-dimensional material-based wiring conductive layer contact structures, electronic devices including the same, and methods of manufacturing the electronic devices

SAMSUNG ELECTRONICS CO LTD0 citations61
US11462477B2Oct 4, 2022

Interconnect structure and electronic apparatus including the same

SAMSUNG ELECTRONICS CO LTD0 citations61
US11424186B2Aug 23, 2022

Semiconductor memory device and apparatus including the same

SAMSUNG ELECTRONICS CO LTD0 citations61
US11329223B2May 10, 2022

Nonvolatile memory apparatus including resistive-change material layer

SAMSUNG ELECTRONICS CO LTD0 citations60
US11158849B2Oct 26, 2021

Lithium ion battery including nano-crystalline graphene electrode

SAMSUNG ELECTRONICS CO LTD1 citations60
US10811604B2Oct 20, 2020

Nonvolatile memory apparatus including resistive-change material layer

SAMSUNG ELECTRONICS CO LTD1 citations60
US12139814B2Nov 12, 2024

Boron nitride layer, apparatus including the same, and method of fabricating the boron nitride layer

SAMSUNG ELECTRONICS CO LTD0 citations59
US11624127B2Apr 11, 2023

Boron nitride layer, apparatus including the same, and method of fabricating the boron nitride layer

SAMSUNG ELECTRONICS CO LTD1 citations59
US11985910B2May 14, 2024

Memristor and neuromorphic device comprising the same

SAMSUNG ELECTRONICS CO LTD0 citations58
US11600774B2Mar 7, 2023

Nonvolatile memory device and operating method of the same

SAMSUNG ELECTRONICS CO LTD0 citations58
US11374171B2Jun 28, 2022

Memristor and neuromorphic device comprising the same

SAMSUNG ELECTRONICS CO LTD0 citations58
US12268106B2Apr 1, 2025

Nonvolatile memory device and operating method of the same

SAMSUNG ELECTRONICS CO LTD0 citations57
US12199129B2Jan 14, 2025

Image sensors integrated with infrared sensors and electronic devices including the same

SAMSUNG ELECTRONICS CO LTD0 citations52
US10910794B2Feb 2, 2021

Light-emitting device comprising photonic cavity

SAMSUNG ELECTRONICS CO LTD0 citations52
US10460935B2Oct 29, 2019

Electronic device having two-dimensional (2D) material layer and method of manufacturing the electronic device by inkjet printing

SAMSUNG ELECTRONICS CO LTD0 citations52
US9515144B2Dec 6, 2016

Fin-type graphene device

SAMSUNG ELECTRONICS CO LTD0 citations52
US12484260B2Nov 25, 2025

Vertical NAND flash memory device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations49

UIF UNIV INDUSTRY FOUNDATION YONSEI UNIV

1 patent

Showing the top 50 of 53 patents by PatentIndex Score.