Inventor
ROCKLEIN MATTHEW N
US36 patents
⚠️ This page may combine multiple inventors who share the name “ROCKLEIN MATTHEW N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
31 patentsUS9460770B1Oct 4, 2016
Methods of operating ferroelectric memory cells, and related ferroelectric memory cells
MICRON TECHNOLOGY INC27 citations93
US9231206B2Jan 5, 2016
Methods of forming a ferroelectric memory cell
MICRON TECHNOLOGY INC21 citations92
US10403630B2Sep 3, 2019
Semiconductor devices including ferroelectric materials
MICRON TECHNOLOGY INC3 citations84
US9698343B2Jul 4, 2017
Semiconductor device structures including ferroelectric memory cells
MICRON TECHNOLOGY INC3 citations84
US10192605B2Jan 29, 2019
Memory cells and semiconductor devices including ferroelectric materials
MICRON TECHNOLOGY INC8 citations83
US9899072B2Feb 20, 2018
Methods of operating ferroelectric memory cells, and related ferroelectric memory cells and capacitors
MICRON TECHNOLOGY INC4 citations83
US9697881B2Jul 4, 2017
Methods of operating ferroelectric memory cells, and related ferroelectric memory cells and capacitors
MICRON TECHNOLOGY INC6 citations83
US10177152B1Jan 8, 2019
Integrated assemblies comprising stud-type capacitors
MICRON TECHNOLOGY INC4 citations73
US11289487B2Mar 29, 2022
Doped titanium nitride materials for DRAM capacitors, and related semiconductor devices, systems, and methods
MICRON TECHNOLOGY INC3 citations71
US11145710B1Oct 12, 2021
Electrode/dielectric barrier material formation and structures
MICRON TECHNOLOGY INC5 citations71
US10811419B1Oct 20, 2020
Storage node shaping
MICRON TECHNOLOGY INC4 citations70
US9466660B2Oct 11, 2016
Semiconductor structures including molybdenum nitride, molybdenum oxynitride or molybdenum-based alloy material, and method of making such structures
MICRON TECHNOLOGY INC5 citations69
US10062703B2Aug 28, 2018
Methods of forming a ferroelectric memory cell
MICRON TECHNOLOGY INC1 citations63
US12167610B2Dec 10, 2024
Semiconductor devices including ferroelectric materials
MICRON TECHNOLOGY INC0 citations62
US11417661B2Aug 16, 2022
Integrated assemblies comprising stud-type capacitors
MICRON TECHNOLOGY INC0 citations62
US11201286B2Dec 14, 2021
Resistive memory cell
MICRON TECHNOLOGY INC0 citations62
US11043502B2Jun 22, 2021
Semiconductor devices including ferroelectric materials
MICRON TECHNOLOGY INC0 citations62
US10964536B2Mar 30, 2021
Formation of an atomic layer of germanium in an opening of a substrate material having a high aspect ratio
MICRON TECHNOLOGY INC0 citations62
US12507395B2Dec 23, 2025
Doped titanium nitride materials for dram capacitors, and related semiconductor devices
MICRON TECHNOLOGY INC0 citations61
US12062688B2Aug 13, 2024
Dielectric materials, capacitors and memory arrays
MICRON TECHNOLOGY INC0 citations58
US10985239B2Apr 20, 2021
Oxidative trim
MICRON TECHNOLOGY INC0 citations58
US12193208B2Jan 7, 2025
Capacitors with electrodes having a portion of material removed, and related semiconductor devices, systems, and methods
MICRON TECHNOLOGY INC0 citations56
US10600788B2Mar 24, 2020
Integrated assemblies comprising stud-type capacitors
MICRON TECHNOLOGY INC0 citations52
US10586923B2Mar 10, 2020
Resistive memory cell
MICRON TECHNOLOGY INC0 citations52
US9159921B2Oct 13, 2015
Resistive memory cell
MICRON TECHNOLOGY INC0 citations52
US9006702B2Apr 14, 2015
Semiconductor structure including a zirconium oxide material
MICRON TECHNOLOGY INC0 citations52
US11139256B2Oct 5, 2021
Tamper-resistant integrated circuits, and related methods
MICRON TECHNOLOGY INC0 citations51
US10438643B2Oct 8, 2019
Devices and apparatuses including asymmetric ferroelectric materials, and related methods
MICRON TECHNOLOGY INC0 citations51
US9576805B2Feb 21, 2017
Fortification of charge-storing material in high-K dielectric environments and resulting apparatuses
MICRON TECHNOLOGY INC0 citations51
US11251261B2Feb 15, 2022
Forming a barrier material on an electrode
MICRON TECHNOLOGY INC0 citations48
US12046658B2Jul 23, 2024
Electrode formation
MICRON TECHNOLOGY INC0 citations47
RAMASWAMY D V NIRMAL
2 patentsUS8288811B2Oct 16, 2012
Fortification of charge-storing material in high-K dielectric environments and resulting apparatuses
RAMASWAMY D V NIRMAL26 citations92
US8987806B2Mar 24, 2015
Fortification of charge storing material in high K dielectric environments and resulting apparatuses
RAMASWAMY D V NIRMAL0 citations48