Inventor
FENWICK DAVID
US23 patents
⚠️ This page may combine multiple inventors who share the name “FENWICK DAVID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
20 patentsUS10573497B2Feb 25, 2020
Multi-layer plasma resistant coating by atomic layer deposition
APPLIED MATERIALS INC9 citations84
US10443125B2Oct 15, 2019
Flourination process to create sacrificial oxy-flouride layer
APPLIED MATERIALS INC6 citations84
US10186400B2Jan 22, 2019
Multi-layer plasma resistant coating by atomic layer deposition
APPLIED MATERIALS INC12 citations84
US11326253B2May 10, 2022
Atomic layer deposition of protective coatings for semiconductor process chamber components
APPLIED MATERIALS INC1 citations73
US11251023B2Feb 15, 2022
Multi-layer plasma resistant coating by atomic layer deposition
APPLIED MATERIALS INC2 citations73
US11198937B2Dec 14, 2021
Atomic layer deposition of protective coatings for semiconductor process chamber components
APPLIED MATERIALS INC2 citations73
US11198936B2Dec 14, 2021
Atomic layer deposition of protective coatings for semiconductor process chamber components
APPLIED MATERIALS INC1 citations73
US11008653B2May 18, 2021
Multi-layer coating with diffusion barrier layer and erosion resistant layer
APPLIED MATERIALS INC2 citations73
US10563303B2Feb 18, 2020
Metal oxy-flouride films based on oxidation of metal flourides
APPLIED MATERIALS INC2 citations73
US11572617B2Feb 7, 2023
Protective metal oxy-fluoride coatings
APPLIED MATERIALS INC3 citations72
US11540432B2Dec 27, 2022
Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools
APPLIED MATERIALS INC1 citations70
US12104246B2Oct 1, 2024
Atomic layer deposition of protective coatings for semiconductor process chamber components
APPLIED MATERIALS INC0 citations62
US12002657B2Jun 4, 2024
Multi-layer plasma resistant coating by atomic layer deposition
APPLIED MATERIALS INC0 citations62
US11667577B2Jun 6, 2023
Y2O3—ZrO2 erosion resistant material for chamber components in plasma environments
APPLIED MATERIALS INC0 citations62
US11014853B2May 25, 2021
Y2O3—ZrO2 erosion resistant material for chamber components in plasma environments
APPLIED MATERIALS INC0 citations62
US12492464B2Dec 9, 2025
Protective metal oxy-fluoride coatings
APPLIED MATERIALS INC0 citations61
US12351910B2Jul 8, 2025
Hafnium aluminum oxide coatings deposited by atomic layer deposition
APPLIED MATERIALS INC0 citations60
US12564012B2Feb 24, 2026
Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools
APPLIED MATERIALS INC0 citations59
US12004337B2Jun 4, 2024
Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools
APPLIED MATERIALS INC0 citations59
US11547030B2Jan 3, 2023
Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools
APPLIED MATERIALS INC0 citations59