Inventor
YOU JAN-WEN
TW9 patents
Patents
9 patentsUS7234128B2Jun 19, 2007
Method for improving the critical dimension uniformity of patterned features on wafers
TAIWAN SEMICONDUCTOR MFG21 citations92
US7131102B2Oct 31, 2006
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era
TAIWAN SEMICONDUCTOR MFG15 citations92
US6711732B1Mar 23, 2004
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era
TAIWAN SEMICONDUCTOR MFG25 citations92
US6973636B2Dec 6, 2005
Method of defining forbidden pitches for a lithography exposure tool
TAIWAN SEMICONDUCTOR MFG12 citations82
US7036108B2Apr 25, 2006
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution era
TAIWAN SEMICONDUCTOR MFG1 citations62
US7013453B2Mar 14, 2006
Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution ERA
TAIWAN SEMICONDUCTOR MFG1 citations62
US7643976B2Jan 5, 2010
Method and system for identifying lens aberration sensitive patterns in an integrated circuit chip
TAIWAN SEMICONDUCTOR MFG6 citations61
US7474788B2Jan 6, 2009
Method and system for enhancing image resolution using a modification vector
TAIWAN SEMICONDUCTOR MFG0 citations51
US7175941B2Feb 13, 2007
Phase shift assignments for alternate PSM
TAIWAN SEMICONDUCTOR MFG0 citations51