Inventor

KUTHI ANDRAS

US54 patents

⚠️ This page may combine multiple inventors who share the name “KUTHI ANDRAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KUTHI ANDRAS

LAM RES CORP

Bevel etcher with gap control

Minimizing arcing in a plasma processing chamber

Apparatus and methods for minimizing arcing in a plasma processing chamber

Method and apparatus for producing uniform process rates

Apparatus and methods for improving the stability of RF power delivery to a plasma load

Plasma processor apparatus and method, and antenna

Plasma processing system apparatus, and method for delivering RF power to a plasma processing

Plasma processing systems

Plasma processor with electrode simultaneously responsive to plural frequencies

Semiconductor process chamber electrode

Apparatus and method for controlling the voltage applied to an electrostatic shield used in a plasma generator

Apparatus and methods for improving the stability of RF power delivery to a plasma load

Apparatus for controlling the voltage applied to an electrostatic shield used in a plasma generator

System, apparatus, and method for processing wafer using single frequency RF power in plasma processing chamber

Matching circuit for a complex radio frequency (RF) waveform

Temperature control system for plasma processing apparatus

Antenna for plasma processor apparatus

Method for adjusting voltage on a powered Faraday shield

Method and apparatus for producing uniform process rates

Edge electrodes with variable power

Electrically enhancing the confinement of plasma

Method and apparatus for producing uniform processing rates

Apparatus for the removal of a fluorinated polymer from a substrate and methods therefor

Method and apparatus for producing uniform process rates

Methods for processing bevel edge etching

Megasonic cleaning efficiency using auto-tuning of an RF generator at constant maximum efficiency

Measuring and controlling wafer potential in pulsed RF bias processing

Articulated direct-mount inductor and associated systems and methods

Reducing plasma ignition pressure

Megasonic cleaning efficiency using auto-tuning of a RF generator at constant maximum efficiency

UNIV SOUTHERN CALIFORNIA

High voltage nanosecond pulse generator using fast recovery diodes for cell electro-manipulation

High voltage nanosecond pulse generator using fast recovery diodes for cell electro-manipulation

Compact subnanosecond high voltage pulse generation system for cell electro-manipulation

High voltage nanosecond pulse generator using fast recovery diodes for cell electro-manipulation

SEXTON GREGORY S

Edge electrodes with dielectric covers

Bevel edge plasma chamber with top and bottom edge electrodes

Plasma chamber for wafer bevel edge processing

SANDERS JASON

Nanosecond pulse generator with a protector circuit

Nanosecond pulse generator

TRANSIENT PLASMA SYSTEMS INC

Repetitive ignition system for enhanced combustion

Repetitive ignition system for enhanced combustion

HOWALD ARTHUR M

Antenna for plasma processor and apparatus

Antenna for plasma processor and apparatus

UNIV CALIFORNIA

Electrodeless plasma torch apparatus and methods for the dissociation of hazardous waste

KRISHNASWAMY PAVITRA

Compact subnanosecond high voltage pulse generation system for cell electro-manipulation

YOON HYUNGSUK ALEXANDER

Apparatus for the removal of a fluorinated polymer from a substrate

KIM YUNSANG

Bevel clean device

SINGLETON DANIEL R

Electrodes for multi-point ignition using single or multiple transient plasma discharges

KUTHI ANDRAS

Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing

CALIFORNIA INST OF TECHN

Dielectric barrier discharge reactor for catalytic nonthermal plasma production of hydrogen from methane