Inventor

CHENG NAI-HAN

TW39 patents

⚠️ This page may combine multiple inventors who share the name “CHENG NAI-HAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHENG NAI-HAN

TAIWAN SEMICONDUCTOR MFG CO LTD

3D IC bump height metrology APC

3D IC bump height metrology APC

Wafer processing system using multi-zone chuck

Substrate rapid thermal heating system and methods

Broadband wafer defect detection

Ion beam source for semiconductor ion implantation

Ion implantation gas supply system

Ion impantation gas supply system

Method for manufacturing semiconductor structure

Method for manufacturing semiconductor structure

3D IC bump height metrology APC

Broadband wafer defect detection

Broadband wafer defect detection

Ion implantation system and source bushing thereof

Ion implantation system and source bushing thereof

Ion implantation gas supply system

Semiconductor manufacturing apparatus and method thereof

3D IC bump height metrology APC

Defect inspection and repairing method and associated system and non-transitory computer readable medium

Semiconductor manufacturing apparatus and method thereof

Ion implantation with charge and direction control

Ion beam dimension control for ion implantation process and apparatus, and advanced process control

Method for monitoring ion implantation

TAIWAN SEMICONDUCTOR MFG

Systems and methods for implant dosage control

Beam monitoring device, method, and system

Shallow junction formation and high dopant activation rate of MOS devices

Apparatus for monitoring ion implantation

Method and apparatus for controlling beam angle during ion implantation of a semiconductor wafer based upon pressure

CHENG NAI-HAN

Wafer processing method and system using multi-zone chuck

Multi-ion beam implantation apparatus and method

Method and system for controlling an implantation process

Multi-factor advanced process control method and system for integrated circuit fabrication

HWANG CHIH-HONG

Ion beam dimension control for ion implantation process and apparatus, and advanced process control

Beam monitoring device, method, and system

Ion implantation with charge and direction control

WANG LI-TING

Junction profile engineering using staged thermal annealing

NIEH CHUN-FENG

Shallow junction formation and high dopant activation rate of MOS devices

CHANG CHUN-LIN

Apparatus for monitoring ion implantation

CHEN JUAN-LIN

Dosage accuracy monitoring systems of implanters