Inventor
MAYS EBONY L
US10 patents
Patents
10 patentsUS10734379B2Aug 4, 2020
Fin end plug structures for advanced integrated circuit structure fabrication
INTEL CORP9 citations82
US11380683B2Jul 5, 2022
Fin end plug structures for advanced integrated circuit structure fabrication
INTEL CORP3 citations71
US10861850B2Dec 8, 2020
Fin end plug structures for advanced integrated circuit structure fabrication
INTEL CORP2 citations71
US11990364B2May 21, 2024
Filling openings by combining non-flowable and flowable processes
INTEL CORP1 citations69
US11978657B2May 7, 2024
Filling openings by combining non-flowable and flowable processes
INTEL CORP1 citations69
US12284826B2Apr 22, 2025
Fin end plug structures for advanced integrated circuit structure fabrication
INTEL CORP0 citations60
US11961838B2Apr 16, 2024
Fin end plug structures for advanced integrated circuit structure fabrication
INTEL CORP0 citations60
US12300533B2May 13, 2025
Filling openings by combining non-flowable and flowable processes
INTEL CORP0 citations58
US10964800B2Mar 30, 2021
Semiconductor device having fin-end stress-inducing features
INTEL CORP0 citations50
US10811251B2Oct 20, 2020
Dielectric gap-fill material deposition
INTEL CORP0 citations47