P

Inventor

LIN CHIH-AN

TW16 patents
⚠️ This page may combine multiple inventors who share the name “LIN CHIH-AN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GLOBE UNION IND CORP

9 patents
USD1121783SApr 7, 2026

Faucet

GLOBE UNION IND CORP0 citations62
USD1120227SMar 24, 2026

Faucet

GLOBE UNION IND CORP0 citations62
USD1117650SMar 10, 2026

Spout

GLOBE UNION IND CORP0 citations62
USD1116028SMar 3, 2026

Faucet

GLOBE UNION IND CORP0 citations62
USD1114186SFeb 17, 2026

Faucet

GLOBE UNION IND CORP0 citations62
USD1112614SFeb 10, 2026

Showerhead

GLOBE UNION IND CORP0 citations62
USD1112628SFeb 10, 2026

Faucet

GLOBE UNION IND CORP0 citations62
USD1110476SJan 27, 2026

Valve

GLOBE UNION IND CORP0 citations62
USD1110474SJan 27, 2026

Faucet

GLOBE UNION IND CORP0 citations62

AIHOL CORP

3 patents
US12128108B2Oct 29, 2024

Hyaluronan conjugates and uses thereof

AIHOL CORP0 citations56
US11524079B2Dec 13, 2022

Hyaluronan conjugates and uses thereof

AIHOL CORP0 citations56
US11458204B2Oct 4, 2022

Method for improving substitution rate and/or substitution efficiency of hyaluronan-drug conjugates

AIHOL CORP0 citations56

CHEN CHUN-KUANG

1 patent
US8741552B2Jun 3, 2014

Double patterning strategy for contact hole and trench in photolithography

CHEN CHUN-KUANG9 citations82

YEH HSIAO-WEI

1 patent
US8158335B2Apr 17, 2012

High etch resistant material for double patterning

YEH HSIAO-WEI6 citations70

CUI JI

1 patent
US8623766B2Jan 7, 2014

Composition and method for polishing aluminum semiconductor substrates

CUI JI2 citations60

TAIWAN SEMICONDUCTOR MFG

1 patent
US9323155B2Apr 26, 2016

Double patterning strategy for contact hole and trench in photolithography

TAIWAN SEMICONDUCTOR MFG1 citations51