P

Inventor

KANEKO AKIHIRO

JP36 patents
⚠️ This page may combine multiple inventors who share the name “KANEKO AKIHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJIFILM CORP

13 patents
US12038689B2Jul 16, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP1 citations62
US12032288B2Jul 9, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP1 citations62
US12001140B2Jun 4, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP0 citations62
US7884146B2Feb 8, 2011

Polymer material containing ultraviolet absorbent

FUJIFILM CORP4 citations62
US11656548B2May 23, 2023

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device

FUJIFILM CORP1 citations61
US11604414B2Mar 14, 2023

Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP1 citations60
US12422752B2Sep 23, 2025

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP0 citations51
US12164228B2Dec 10, 2024

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resin

FUJIFILM CORP0 citations51
US11640113B2May 2, 2023

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device

FUJIFILM CORP0 citations51
US11604412B2Mar 14, 2023

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

FUJIFILM CORP0 citations51
US9508934B2Nov 29, 2016

Organic film transistor, organic semiconductor film, and organic semiconductor material and use applications thereof

FUJIFILM CORP1 citations51
US9653686B2May 16, 2017

Organic film transistor, organic semiconductor film, organic semiconductor material and application of these

FUJIFILM CORP0 citations41
US9798044B2Oct 24, 2017

Nonlinear optical materials and nonlinear optical device using the same

FUJIFILM CORP0 citations38

RICOH CO LTD

4 patents

TOYOTA MOTOR CO LTD

4 patents

HITACHI LTD

2 patents

SAWADA TOYOSHI

2 patents

KANEKO AKIHIRO

2 patents

FUJITSU LTD

1 patent

NEC CORP

1 patent

YAMAUCHI YOSHITAKA

1 patent

SUMIZAWA AKIO

1 patent

IBM

1 patent

SUZUKI NAMIE

1 patent

WATANABE HISAYOSHI

1 patent

SONY CHEMICALS CORP

1 patent

OGINO KOHTAROH

1 patent