Inventor
MATSUZAWA KOUMEI
JP3 patents
Patents
3 patentsUS7063871B2Jun 20, 2006
CVD process capable of reducing incubation time
TOKYO ELECTRON LTD4 citations62
US7699945B2Apr 20, 2010
Substrate treatment method and film forming method, film forming apparatus, and computer program
TOKYO ELECTRON LTD2 citations59
US7456109B2Nov 25, 2008
Method for cleaning substrate processing chamber
TOKYO ELECTRON LTD0 citations51