Inventor
CHOI SOO YOUNG
KR178 patents
⚠️ This page may combine multiple inventors who share the name “CHOI SOO YOUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
29 patentsUS7785672B2Aug 31, 2010
Method of controlling the film properties of PECVD-deposited thin films
APPLIED MATERIALS INC247 citations99
US6825134B2Nov 30, 2004
Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow
APPLIED MATERIALS INC595 citations99
US6942753B2Sep 13, 2005
Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition
APPLIED MATERIALS INC810 citations98
US7514936B2Apr 7, 2009
Detection and suppression of electrical arcing
APPLIED MATERIALS INC59 citations96
US7292045B2Nov 6, 2007
Detection and suppression of electrical arcing
APPLIED MATERIALS INC45 citations94
US7902991B2Mar 8, 2011
Frequency monitoring to detect plasma process abnormality
APPLIED MATERIALS INC24 citations92
US7582515B2Sep 1, 2009
Multi-junction solar cells and methods and apparatuses for forming the same
APPLIED MATERIALS INC36 citations92
US7125758B2Oct 24, 2006
Controlling the properties and uniformity of a silicon nitride film by controlling the film forming precursors
APPLIED MATERIALS INC47 citations92
US7429410B2Sep 30, 2008
Diffuser gravity support
APPLIED MATERIALS INC32 citations91
US10262837B2Apr 16, 2019
Plasma uniformity control by gas diffuser hole design
APPLIED MATERIALS INC5 citations84
US9431631B2Aug 30, 2016
Plasma curing of PECVD HMDSO film for OLED applications
APPLIED MATERIALS INC5 citations84
US9397318B2Jul 19, 2016
Method for hybrid encapsulation of an organic light emitting diode
APPLIED MATERIALS INC8 citations84
US9269923B2Feb 23, 2016
Barrier films for thin film encapsulation
APPLIED MATERIALS INC12 citations84
US8343592B2Jan 1, 2013
Asymmetrical RF drive for electrode of plasma chamber
APPLIED MATERIALS INC13 citations84
US7972470B2Jul 5, 2011
Asymmetric grounding of rectangular susceptor
APPLIED MATERIALS INC10 citations84
US7884035B2Feb 8, 2011
Method of controlling film uniformity and composition of a PECVD-deposited A-SiNx : H gate dielectric film deposited over a large substrate surface
APPLIED MATERIALS INC8 citations84
US7754294B2Jul 13, 2010
Method of improving the uniformity of PECVD-deposited thin films
APPLIED MATERIALS INC14 citations84
US7199061B2Apr 3, 2007
Pecvd silicon oxide thin film deposition
APPLIED MATERIALS INC12 citations84
US10043641B2Aug 7, 2018
Methods and apparatus for processing chamber cleaning end point detection
APPLIED MATERIALS INC7 citations83
US7741144B2Jun 22, 2010
Plasma treatment between deposition processes
APPLIED MATERIALS INC14 citations83
US9677177B2Jun 13, 2017
Substrate support with quadrants
APPLIED MATERIALS INC6 citations82
US7993700B2Aug 9, 2011
Silicon nitride passivation for a solar cell
APPLIED MATERIALS INC8 citations81
US12362149B2Jul 15, 2025
Film stress control for plasma enhanced chemical vapor deposition
APPLIED MATERIALS INC1 citations74
US10312058B2Jun 4, 2019
Plasma uniformity control by gas diffuser hole design
APPLIED MATERIALS INC3 citations73
US10087524B2Oct 2, 2018
Showerhead support structure for improved gas flow
APPLIED MATERIALS INC5 citations73
US9818606B2Nov 14, 2017
Amorphous silicon thickness uniformity improved by process diluted with hydrogen and argon gas mixture
APPLIED MATERIALS INC4 citations73
US9502686B2Nov 22, 2016
Fluorine-containing polymerized HMDSO applications for OLED thin film encapsulation
APPLIED MATERIALS INC3 citations73
US9299558B2Mar 29, 2016
Run-to-run stability of film deposition
APPLIED MATERIALS INC3 citations73
US8381677B2Feb 26, 2013
Prevention of film deposition on PECVD process chamber wall
APPLIED MATERIALS INC6 citations73
CHOI SOO YOUNG
10 patentsUS8328939B2Dec 11, 2012
Diffuser plate with slit valve compensation
CHOI SOO YOUNG743 citations99
US8074599B2Dec 13, 2011
Plasma uniformity control by gas diffuser curvature
CHOI SOO YOUNG253 citations99
US8173228B2May 8, 2012
Particle reduction on surfaces of chemical vapor deposition processing apparatus
CHOI SOO YOUNG122 citations98
US8083853B2Dec 27, 2011
Plasma uniformity control by gas diffuser hole design
CHOI SOO YOUNG753 citations98
US9382621B2Jul 5, 2016
Ground return for plasma processes
CHOI SOO YOUNG27 citations93
US8795793B2Aug 5, 2014
Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
CHOI SOO YOUNG16 citations92
US9200368B2Dec 1, 2015
Plasma uniformity control by gas diffuser hole design
CHOI SOO YOUNG6 citations84
US8142606B2Mar 27, 2012
Apparatus for depositing a uniform silicon film and methods for manufacturing the same
CHOI SOO YOUNG7 citations84
US8962567B2Feb 24, 2015
Eye drop composition for prevention and treatment of ophthalmic diseases containing fusion protein of FK506 binding protein
CHOI SOO YOUNG7 citations81
US9758869B2Sep 12, 2017
Anodized showerhead
CHOI SOO YOUNG4 citations73
TINER ROBIN L
1 patentPARK BEOM SOO
1 patentAPPLIED KOMATSU TECHNOLOGY INC
1 patentKELLER ERNST
1 patentBACHRACH ROBERT Z
1 patentCHOI YOUNG JIN
1 patentWON TAE KYUNG
1 patentSON OCK SOO
1 patentANWAR SUHAIL
1 patentSHENG SHURAN
1 patentPOLYMER VENTURES INC
1 patentShowing the top 50 of 178 patents by PatentIndex Score.