Inventor
PAI CHIH-YANG
TW16 patents
⚠️ This page may combine multiple inventors who share the name “PAI CHIH-YANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
8 patentsUS6624018B1Sep 23, 2003
Method of fabricating a DRAM device featuring alternate fin type capacitor structures
TAIWAN SEMICONDUCTOR MFG78 citations97
US6555442B1Apr 29, 2003
Method of forming shallow trench isolation with rounded corner and divot-free by using disposable spacer
TAIWAN SEMICONDUCTOR MFG35 citations92
US6881622B2Apr 19, 2005
Aqueous ammonium hydroxide amorphous silicon etch method for forming microelectronic capacitor structure
TAIWAN SEMICONDUCTOR MFG19 citations89
US8759193B2Jun 24, 2014
Method of fabricating semiconductor device
TAIWAN SEMICONDUCTOR MFG6 citations84
US7208369B2Apr 24, 2007
Dual poly layer and method of manufacture
TAIWAN SEMICONDUCTOR MFG11 citations84
US6670279B1Dec 30, 2003
Method of forming shallow trench isolation with rounded corners and divot-free by using in-situ formed spacers
TAIWAN SEMICONDUCTOR MFG14 citations84
US9269760B2Feb 23, 2016
Method of fabricating semiconductor device
TAIWAN SEMICONDUCTOR MFG3 citations73
US8969937B2Mar 3, 2015
Semiconductor device
TAIWAN SEMICONDUCTOR MFG3 citations63
TAIWAN SEMICONDUCTOR MFG CO LTD
5 patentsUS11728375B2Aug 15, 2023
Metal-insulator-metal (MIM) capacitor structure
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11031458B2Jun 8, 2021
Metal-insulator-metal (MIM) capacitor structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10468478B2Nov 5, 2019
Metal-insulator-metal (MIM) capacitor structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US9614025B2Apr 4, 2017
Method of fabricating semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11362170B2Jun 14, 2022
Metal-insulator-metal (MIM) capacitor structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62