Inventor
HIBBS MICHAEL S
US31 patents
⚠️ This page may combine multiple inventors who share the name “HIBBS MICHAEL S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
28 patentsUS6368881B1Apr 9, 2002
Wafer thickness control during backside grind
IBM54 citations96
US6190836B1Feb 20, 2001
Methods for repair of photomasks
IBM75 citations95
US6165649ADec 26, 2000
Methods for repair of photomasks
IBM70 citations95
US6090507AJul 18, 2000
Methods for repair of photomasks
IBM76 citations95
US5300786AApr 5, 1994
Optical focus phase shift test pattern, monitoring system and process
IBM202 citations94
US7257247B2Aug 14, 2007
Mask defect analysis system
IBM13 citations92
US6887126B2May 3, 2005
Wafer thickness control during backside grind
IBM25 citations92
US6731378B2May 4, 2004
Pellicle distortion reduction
IBM26 citations92
US6627361B2Sep 30, 2003
Assist features for contact hole mask patterns
IBM29 citations92
US5552718ASep 3, 1996
Electrical test structure and method for space and line measurement
IBM29 citations92
US6156461ADec 5, 2000
Method for repair of photomasks
IBM26 citations91
US5508803AApr 16, 1996
Method and apparatus for monitoring lithographic exposure
IBM66 citations91
US6110624AAug 29, 2000
Multiple polarity mask exposure method
IBM21 citations90
US5614990AMar 25, 1997
Illumination tailoring system using photochromic filter
IBM34 citations89
US7239376B2Jul 3, 2007
Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices
IBM10 citations82
US6284443B1Sep 4, 2001
Method and apparatus for image adjustment
IBM19 citations80
US6834548B1Dec 28, 2004
Method and apparatus for reduction of high-frequency vibrations in thick pellicles
IBM8 citations74
US6582857B1Jun 24, 2003
Repair of masks to promote adhesion of patches
IBM11 citations70
US7492941B2Feb 17, 2009
Mask defect analysis system
IBM3 citations62
US7492940B2Feb 17, 2009
Mask defect analysis system
IBM2 citations62
US6824932B2Nov 30, 2004
Self-aligned alternating phase shift mask patterning process
IBM4 citations62
US7742632B2Jun 22, 2010
Alternating phase shift mask inspection using biased inspection data
IBM2 citations60
US7642016B2Jan 5, 2010
Phase calibration for attenuating phase-shift masks
IBM0 citations52
US7416820B2Aug 26, 2008
Pellicle film optimized for immersion lithography systems with NA>1
IBM1 citations52
US7134933B2Nov 14, 2006
Wafer thickness control during backside grind
IBM0 citations52
US7061590B2Jun 13, 2006
Pellicle distortion reduction
IBM1 citations52
US6950183B2Sep 27, 2005
Apparatus and method for inspection of photolithographic mask
IBM1 citations52
US8815475B2Aug 26, 2014
Reticle carrier
IBM0 citations49