Inventor
FURUHATA TOMOYUKI
JP33 patents
⚠️ This page may combine multiple inventors who share the name “FURUHATA TOMOYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEIKO EPSON CORP
31 patentsUS6337250B2Jan 8, 2002
Semiconductor device containing MOS elements and method of fabricating the same
SEIKO EPSON CORP55 citations96
US6294427B1Sep 25, 2001
Non-volatile semiconductor memory device and fabrication method thereof
SEIKO EPSON CORP52 citations96
US6522587B1Feb 18, 2003
Non-volatile semiconductor memory devices
SEIKO EPSON CORP22 citations93
US6429073B1Aug 6, 2002
Methods for manufacturing semiconductor devices having a non-volatile memory transistor
SEIKO EPSON CORP29 citations93
US6696340B2Feb 24, 2004
Semiconductor devices having a non-volatile memory transistor and methods for manufacturing the same
SEIKO EPSON CORP48 citations92
US6537869B1Mar 25, 2003
Semiconductor devices having a non-volatile memory transistor and methods for manufacturing the same
SEIKO EPSON CORP16 citations92
US6249021B1Jun 19, 2001
Nonvolatile semiconductor memory device and method of manufacturing the same
SEIKO EPSON CORP21 citations92
US5059549AOct 22, 1991
Method of manufacturing a bi-mos device with a polycrystalline resistor
SEIKO EPSON CORP43 citations92
US6828681B2Dec 7, 2004
Semiconductor devices having contact pads and methods of manufacturing the same
SEIKO EPSON CORP14 citations84
US6717204B1Apr 6, 2004
Semiconductor devices having a non-volatile memory transistor
SEIKO EPSON CORP19 citations84
US7972917B2Jul 5, 2011
Method for manufacturing semiconductor device and semiconductor device
SEIKO EPSON CORP9 citations82
US6812519B2Nov 2, 2004
Semiconductor devices having a non-volatile memory transistor and methods for manufacturing the same
SEIKO EPSON CORP9 citations74
US6756629B1Jun 29, 2004
Semiconductor devices including a multi-well and split-gate non-volatile memory transistor structure
SEIKO EPSON CORP8 citations74
US6673678B2Jan 6, 2004
Non-volatile semiconductor memory device and manufacturing method thereof
SEIKO EPSON CORP7 citations74
US6355526B1Mar 12, 2002
Non-volatile semiconductor memory device and method of manufacturing the same
SEIKO EPSON CORP9 citations74
US6320218B1Nov 20, 2001
Non-volatile semiconductor memory device and manufacturing method thereof
SEIKO EPSON CORP10 citations74
US5315150AMay 24, 1994
Semiconductor device and method of manufacturing the same
SEIKO EPSON CORP16 citations74
US7026685B2Apr 11, 2006
Semiconductor devices having a non-volatile memory transistor and methods for manufacturing the same
SEIKO EPSON CORP3 citations63
US6838336B2Jan 4, 2005
Semiconductor devices having a non-volatile memory transistor and methods for manufacturing the same
SEIKO EPSON CORP2 citations63
US6800894B1Oct 5, 2004
Semiconductor devices, circuit substrates and electronic devices
SEIKO EPSON CORP3 citations63
US6122192ASep 19, 2000
Non-volatile semiconductor memory device and fabrication method thereof
SEIKO EPSON CORP4 citations63
US5336911AAug 9, 1994
Semiconductor device
SEIKO EPSON CORP6 citations63
US6921964B2Jul 26, 2005
Semiconductor device having a non-volatile memory transistor formed on a semiconductor
SEIKO EPSON CORP3 citations54
US10319656B2Jun 11, 2019
Semiconductor device and electronic apparatus encapsulated in resin with embedded filler particles
SEIKO EPSON CORP0 citations52
US9997625B2Jun 12, 2018
Semiconductor device and method for manufacturing the same
SEIKO EPSON CORP1 citations52
US9412738B2Aug 9, 2016
Semiconductor device
SEIKO EPSON CORP0 citations52
US7163861B2Jan 16, 2007
Semiconductor devices, methods of manufacturing semiconductor devices, circuit substrates and electronic devices
SEIKO EPSON CORP1 citations52
US5250447AOct 5, 1993
Semiconductor device and method of manufacturing the same
SEIKO EPSON CORP1 citations52
US9397171B2Jul 19, 2016
Semiconductor device and manufacturing method for the same
SEIKO EPSON CORP0 citations42
US9190477B2Nov 17, 2015
Semiconductor device and manufacturing method therefor
SEIKO EPSON CORP0 citations42
US9012312B2Apr 21, 2015
Semiconductor device manufacturing method
SEIKO EPSON CORP0 citations42