P

Inventor

LI MINGQI

CN80 patents
⚠️ This page may combine multiple inventors who share the name “LI MINGQI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ROHM & HAAS ELECT MAT

24 patents
US9442377B1Sep 13, 2016

Wet-strippable silicon-containing antireflectant

ROHM & HAAS ELECT MAT19 citations92
US9046767B2Jun 2, 2015

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

ROHM & HAAS ELECT MAT7 citations84
US9029065B2May 12, 2015

Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article

ROHM & HAAS ELECT MAT7 citations84
US10031420B2Jul 24, 2018

Wet-strippable silicon-containing antireflectant

ROHM & HAAS ELECT MAT13 citations83
US8900794B2Dec 2, 2014

Photoacid generator and photoresist comprising same

ROHM & HAAS ELECT MAT7 citations83
US9508549B2Nov 29, 2016

Methods of forming electronic devices including filling porous features with a polymer

ROHM & HAAS ELECT MAT3 citations73
US9209067B2Dec 8, 2015

Gap-fill methods

ROHM & HAAS ELECT MAT5 citations73
US10241411B2Mar 26, 2019

Topcoat compositions containing fluorinated thermal acid generators

ROHM & HAAS ELECT MAT2 citations72
US10162265B2Dec 25, 2018

Pattern treatment methods

ROHM & HAAS ELECT MAT2 citations72
US10114288B2Oct 30, 2018

Silicon-containing underlayers

ROHM & HAAS ELECT MAT3 citations71
US9110369B2Aug 18, 2015

Photoacid generator, photoresist, coated substrate, and method of forming an electronic device

ROHM & HAAS ELECT MAT2 citations62
US8956799B2Feb 17, 2015

Photoacid generator and photoresist comprising same

ROHM & HAAS ELECT MAT2 citations62
US11506981B2Nov 22, 2022

Photoresist pattern trimming compositions and pattern formation methods

ROHM & HAAS ELECT MAT1 citations61
US10578969B2Mar 3, 2020

Photoresist topcoat compositions and methods of processing photoresist compositions

ROHM & HAAS ELECT MAT1 citations61
US11829069B2Nov 28, 2023

Photoresist compositions and methods

ROHM & HAAS ELECT MAT1 citations59
US11754927B2Sep 12, 2023

Photoresist pattern trimming compositions and pattern formation methods

ROHM & HAAS ELECT MAT0 citations58
US11859082B2Jan 2, 2024

Polymers useful as surface leveling agents

ROHM & HAAS ELECT MAT0 citations52
US10719014B2Jul 21, 2020

Photoresists comprising amide component

ROHM & HAAS ELECT MAT0 citations52
US10042255B2Aug 7, 2018

Block copolymers and pattern treatment compositions and methods

ROHM & HAAS ELECT MAT1 citations52
US9880469B2Jan 30, 2018

Resins for underlayers

ROHM & HAAS ELECT MAT1 citations52
US9809672B2Nov 7, 2017

Aromatic resins for underlayers

ROHM & HAAS ELECT MAT0 citations52
US9601325B2Mar 21, 2017

Aromatic resins for underlayers

ROHM & HAAS ELECT MAT1 citations52
US9540476B2Jan 10, 2017

Aromatic resins for underlayers

ROHM & HAAS ELECT MAT1 citations52
US8790861B2Jul 29, 2014

Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer

ROHM & HAAS ELECT MAT0 citations52

DOW GLOBAL TECHNOLOGIES LLC

8 patents

JIANG LI

7 patents

AQAD EMAD

3 patents

LI MINGQI

3 patents

SHAO QUN

1 patent

SEMICONDUCTOR MFG INT SHANGHAI CORP

1 patent

WANG DEYAN

1 patent

PROKOPOWICZ GREGORY P

1 patent

CHEN FENG

1 patent

Showing the top 50 of 80 patents by PatentIndex Score.