Inventor
LI MINGQI
CN80 patents
⚠️ This page may combine multiple inventors who share the name “LI MINGQI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ROHM & HAAS ELECT MAT
24 patentsUS9442377B1Sep 13, 2016
Wet-strippable silicon-containing antireflectant
ROHM & HAAS ELECT MAT19 citations92
US9046767B2Jun 2, 2015
Photoacid generator, photoresist, coated substrate, and method of forming an electronic device
ROHM & HAAS ELECT MAT7 citations84
US9029065B2May 12, 2015
Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article
ROHM & HAAS ELECT MAT7 citations84
US10031420B2Jul 24, 2018
Wet-strippable silicon-containing antireflectant
ROHM & HAAS ELECT MAT13 citations83
US8900794B2Dec 2, 2014
Photoacid generator and photoresist comprising same
ROHM & HAAS ELECT MAT7 citations83
US9508549B2Nov 29, 2016
Methods of forming electronic devices including filling porous features with a polymer
ROHM & HAAS ELECT MAT3 citations73
US9209067B2Dec 8, 2015
Gap-fill methods
ROHM & HAAS ELECT MAT5 citations73
US10241411B2Mar 26, 2019
Topcoat compositions containing fluorinated thermal acid generators
ROHM & HAAS ELECT MAT2 citations72
US10162265B2Dec 25, 2018
Pattern treatment methods
ROHM & HAAS ELECT MAT2 citations72
US10114288B2Oct 30, 2018
Silicon-containing underlayers
ROHM & HAAS ELECT MAT3 citations71
US9110369B2Aug 18, 2015
Photoacid generator, photoresist, coated substrate, and method of forming an electronic device
ROHM & HAAS ELECT MAT2 citations62
US8956799B2Feb 17, 2015
Photoacid generator and photoresist comprising same
ROHM & HAAS ELECT MAT2 citations62
US11506981B2Nov 22, 2022
Photoresist pattern trimming compositions and pattern formation methods
ROHM & HAAS ELECT MAT1 citations61
US10578969B2Mar 3, 2020
Photoresist topcoat compositions and methods of processing photoresist compositions
ROHM & HAAS ELECT MAT1 citations61
US11829069B2Nov 28, 2023
Photoresist compositions and methods
ROHM & HAAS ELECT MAT1 citations59
US11754927B2Sep 12, 2023
Photoresist pattern trimming compositions and pattern formation methods
ROHM & HAAS ELECT MAT0 citations58
US11859082B2Jan 2, 2024
Polymers useful as surface leveling agents
ROHM & HAAS ELECT MAT0 citations52
US10719014B2Jul 21, 2020
Photoresists comprising amide component
ROHM & HAAS ELECT MAT0 citations52
US10042255B2Aug 7, 2018
Block copolymers and pattern treatment compositions and methods
ROHM & HAAS ELECT MAT1 citations52
US9880469B2Jan 30, 2018
Resins for underlayers
ROHM & HAAS ELECT MAT1 citations52
US9809672B2Nov 7, 2017
Aromatic resins for underlayers
ROHM & HAAS ELECT MAT0 citations52
US9601325B2Mar 21, 2017
Aromatic resins for underlayers
ROHM & HAAS ELECT MAT1 citations52
US9540476B2Jan 10, 2017
Aromatic resins for underlayers
ROHM & HAAS ELECT MAT1 citations52
US8790861B2Jul 29, 2014
Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer
ROHM & HAAS ELECT MAT0 citations52
DOW GLOBAL TECHNOLOGIES LLC
8 patentsUS10287455B2May 14, 2019
Methods for manufacturing block copolymers and articles manufactured therefrom
DOW GLOBAL TECHNOLOGIES LLC2 citations73
US9735023B2Aug 15, 2017
Methods for manufacturing block copolymer compositions and articles manufactured therefrom
DOW GLOBAL TECHNOLOGIES LLC2 citations73
US9703203B2Jul 11, 2017
Compositions and methods for pattern treatment
DOW GLOBAL TECHNOLOGIES LLC2 citations73
US9684241B2Jun 20, 2017
Compositions and methods for pattern treatment
DOW GLOBAL TECHNOLOGIES LLC3 citations73
US9671697B2Jun 6, 2017
Pattern treatment methods
DOW GLOBAL TECHNOLOGIES LLC6 citations73
US9665005B2May 30, 2017
Pattern treatment methods
DOW GLOBAL TECHNOLOGIES LLC3 citations73
US9663682B2May 30, 2017
Methods for manufacturing block copolymers and articles manufactured therefrom
DOW GLOBAL TECHNOLOGIES LLC3 citations73
US9382444B2Jul 5, 2016
Neutral layer polymers, methods of manufacture thereof and articles comprising the same
DOW GLOBAL TECHNOLOGIES LLC3 citations71
JIANG LI
7 patentsUS8851959B2Oct 7, 2014
Chemical mechanical polishing device and polishing element
JIANG LI6 citations73
US8815728B2Aug 26, 2014
Semiconductor device having metal alloy gate and method for manufacturing the same
JIANG LI4 citations71
US8313991B2Nov 20, 2012
Method for fabricating a high-K metal gate MOS
JIANG LI3 citations63
US8858817B2Oct 14, 2014
Polishing apparatus and exception handling method thereof
JIANG LI1 citations52
US8721401B2May 13, 2014
Method for cleaning a polishing pad
JIANG LI0 citations52
US8541308B2Sep 24, 2013
Polishing method and method for forming a gate
JIANG LI0 citations52
US8507336B2Aug 13, 2013
Method for forming metal gate and MOS transistor
JIANG LI1 citations52
AQAD EMAD
3 patentsUS9156785B2Oct 13, 2015
Base reactive photoacid generators and photoresists comprising same
AQAD EMAD9 citations83
US9348220B2May 24, 2016
Photoacid generators and photoresists comprising same
AQAD EMAD5 citations72
US9671689B2Jun 6, 2017
Cholate photoacid generators and photoresists comprising same
AQAD EMAD3 citations71
LI MINGQI
3 patentsSHAO QUN
1 patentSEMICONDUCTOR MFG INT SHANGHAI CORP
1 patentWANG DEYAN
1 patentPROKOPOWICZ GREGORY P
1 patentCHEN FENG
1 patentShowing the top 50 of 80 patents by PatentIndex Score.