Inventor
CHAKRAVARTHI SRINIVASAN
US24 patents
⚠️ This page may combine multiple inventors who share the name “CHAKRAVARTHI SRINIVASAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TEXAS INSTRUMENTS INC
22 patentsUS7061058B2Jun 13, 2006
Forming a retrograde well in a transistor to enhance performance of the transistor
TEXAS INSTRUMENTS INC125 citations99
US6852603B2Feb 8, 2005
Fabrication of abrupt ultra-shallow junctions
TEXAS INSTRUMENTS INC101 citations99
US7786518B2Aug 31, 2010
Growth of unfaceted SiGe in MOS transistor fabrication
TEXAS INSTRUMENTS INC30 citations92
US6797593B2Sep 28, 2004
Methods and apparatus for improved mosfet drain extension activation
TEXAS INSTRUMENTS INC33 citations92
US6682980B2Jan 27, 2004
Fabrication of abrupt ultra-shallow junctions using angled PAI and fluorine implant
TEXAS INSTRUMENTS INC48 citations92
US7553717B2Jun 30, 2009
Recess etch for epitaxial SiGe
TEXAS INSTRUMENTS INC44 citations90
US6830980B2Dec 14, 2004
Semiconductor device fabrication methods for inhibiting carbon out-diffusion in wafers having carbon-containing regions
TEXAS INSTRUMENTS INC22 citations90
US7129127B2Oct 31, 2006
Integration scheme to improve NMOS with poly cap while mitigating PMOS degradation
TEXAS INSTRUMENTS INC16 citations84
US6847089B2Jan 25, 2005
Gate edge diode leakage reduction
TEXAS INSTRUMENTS INC12 citations82
US7179696B2Feb 20, 2007
Phosphorus activated NMOS using SiC process
TEXAS INSTRUMENTS INC12 citations79
US7118977B2Oct 10, 2006
System and method for improved dopant profiles in CMOS transistors
TEXAS INSTRUMENTS INC7 citations74
US7112516B2Sep 26, 2006
Fabrication of abrupt ultra-shallow junctions
TEXAS INSTRUMENTS INC8 citations74
US6927137B2Aug 9, 2005
Forming a retrograde well in a transistor to enhance performance of the transistor
TEXAS INSTRUMENTS INC9 citations74
US7902576B2Mar 8, 2011
Phosphorus activated NMOS using SiC process
TEXAS INSTRUMENTS INC6 citations73
US7795122B2Sep 14, 2010
Antimony ion implantation for semiconductor components
TEXAS INSTRUMENTS INC2 citations63
US7670892B2Mar 2, 2010
Nitrogen based implants for defect reduction in strained silicon
TEXAS INSTRUMENTS INC3 citations63
US6849528B2Feb 1, 2005
Fabrication of ultra shallow junctions from a solid source with fluorine implantation
TEXAS INSTRUMENTS INC3 citations63
US7371648B2May 13, 2008
Method for manufacturing a transistor device having an improved breakdown voltage and a method for manufacturing an integrated circuit using the same
TEXAS INSTRUMENTS INC4 citations62
US7208380B2Apr 24, 2007
Interface improvement by stress application during oxide growth through use of backside films
TEXAS INSTRUMENTS INC4 citations62
US7033879B2Apr 25, 2006
Semiconductor device having optimized shallow junction geometries and method for fabrication thereof
TEXAS INSTRUMENTS INC6 citations58
US7994073B2Aug 9, 2011
Low stress sacrificial cap layer
TEXAS INSTRUMENTS INC0 citations52
US7572716B2Aug 11, 2009
Semiconductor doping with improved activation
TEXAS INSTRUMENTS INC0 citations52