P

Inventor

VAN DER MAST KAREL DIEDERICK

NL26 patents
⚠️ This page may combine multiple inventors who share the name “VAN DER MAST KAREL DIEDERICK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASML NETHERLANDS BV

15 patents
US6778257B2Aug 17, 2004

Imaging apparatus

ASML NETHERLANDS BV953 citations97
US7517211B2Apr 14, 2009

Imprint lithography

ASML NETHERLANDS BV27 citations92
US7502103B2Mar 10, 2009

Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate

ASML NETHERLANDS BV18 citations92
US7116403B2Oct 3, 2006

Lithographic apparatus and device manufacturing method

ASML NETHERLANDS BV30 citations92
US8363220B2Jan 29, 2013

Method of determining overlay error and a device manufacturing method

ASML NETHERLANDS BV9 citations84
US7878791B2Feb 1, 2011

Imprint lithography

ASML NETHERLANDS BV14 citations84
US7656518B2Feb 2, 2010

Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus

ASML NETHERLANDS BV15 citations84
US7500218B2Mar 3, 2009

Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same

ASML NETHERLANDS BV16 citations84
US7023525B2Apr 4, 2006

Imaging apparatus

ASML NETHERLANDS BV13 citations82
US7586598B2Sep 8, 2009

Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate

ASML NETHERLANDS BV7 citations73
US9610727B2Apr 4, 2017

Imprint lithography

ASML NETHERLANDS BV2 citations72
US6930755B2Aug 16, 2005

Lithographic apparatus and device manufacturing method

ASML NETHERLANDS BV5 citations63
US7961309B2Jun 14, 2011

Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate

ASML NETHERLANDS BV4 citations62
US7379579B2May 27, 2008

Imaging apparatus

ASML NETHERLANDS BV1 citations52
US7349068B2Mar 25, 2008

Lithographic apparatus and device manufacturing method

ASML NETHERLANDS BV1 citations52

PHENOM WORLD HOLDING B V

3 patents
US11024481B2Jun 1, 2021

Scanning electron microscope

PHENOM WORLD HOLDING B V0 citations52
US10796879B2Oct 6, 2020

Scanning electron microscope

PHENOM WORLD HOLDING B V0 citations31
US10580613B2Mar 3, 2020

Sample stage

PHENOM WORLD HOLDING B V0 citations27

KRUIJT-STEGEMAN YVONNE WENDELA

2 patents
US8100684B2Jan 24, 2012

Imprint lithography

KRUIJT-STEGEMAN YVONNE WENDELA5 citations72
US8753557B2Jun 17, 2014

Imprint lithography

KRUIJT-STEGEMAN YVONNE WENDELA1 citations61

(unassigned)

1 patent
US6633366B2Oct 14, 2003

Lithographic apparatus, device manufacturing method, and device manufactured thereby

76 citations98

PHILIPS ELECTRON OPTICS BV

1 patent
US6191423B1Feb 20, 2001

Correction device for correcting the spherical aberration in particle-optical apparatus

PHILIPS ELECTRON OPTICS BV50 citations95

PHILIPS CORP

1 patent
US4095104AJun 13, 1978

Electron microscope

PHILIPS CORP11 citations66

AGERE SYST GUARDIAN CORP

1 patent
US7102732B2Sep 5, 2006

Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element

AGERE SYST GUARDIAN CORP0 citations52

LEEWIS CHRISTIAN MARINUS

1 patent
US8848195B2Sep 30, 2014

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate

LEEWIS CHRISTIAN MARINUS0 citations48

ASML HOLDING NV

1 patent
US7403266B2Jul 22, 2008

Maskless lithography systems and methods utilizing spatial light modulator arrays

ASML HOLDING NV1 citations48