Inventor
CHANDRACHOOD MADHAVI R
US21 patents
⚠️ This page may combine multiple inventors who share the name “CHANDRACHOOD MADHAVI R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
18 patentsUS7955516B2Jun 7, 2011
Etching of nano-imprint templates using an etch reactor
APPLIED MATERIALS INC522 citations99
US7682518B2Mar 23, 2010
Process for etching a metal layer suitable for use in photomask fabrication
APPLIED MATERIALS INC183 citations98
US7909961B2Mar 22, 2011
Method and apparatus for photomask plasma etching
APPLIED MATERIALS INC21 citations92
US7771895B2Aug 10, 2010
Method of etching extreme ultraviolet light (EUV) photomasks
APPLIED MATERIALS INC25 citations92
US8017029B2Sep 13, 2011
Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside
APPLIED MATERIALS INC7 citations83
US8002946B2Aug 23, 2011
Mask etch plasma reactor with cathode providing a uniform distribution of etch rate
APPLIED MATERIALS INC8 citations83
US7976671B2Jul 12, 2011
Mask etch plasma reactor with variable process gas distribution
APPLIED MATERIALS INC20 citations83
US7967930B2Jun 28, 2011
Plasma reactor for processing a workpiece and having a tunable cathode
APPLIED MATERIALS INC11 citations83
US7943005B2May 17, 2011
Method and apparatus for photomask plasma etching
APPLIED MATERIALS INC15 citations83
US7520999B2Apr 21, 2009
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another
APPLIED MATERIALS INC16 citations83
US7504041B2Mar 17, 2009
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator
APPLIED MATERIALS INC13 citations83
US7521000B2Apr 21, 2009
Process for etching photomasks
APPLIED MATERIALS INC6 citations72
US11249386B2Feb 15, 2022
Extreme ultraviolet mask with backside coating
APPLIED MATERIALS INC0 citations62
US8012366B2Sep 6, 2011
Process for etching a transparent workpiece including backside endpoint detection steps
APPLIED MATERIALS INC3 citations62
US7431797B2Oct 7, 2008
Plasma reactor with a dynamically adjustable plasma source power applicator
APPLIED MATERIALS INC2 citations62
US7419551B2Sep 2, 2008
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another
APPLIED MATERIALS INC4 citations62
US7964818B2Jun 21, 2011
Method and apparatus for photomask etching
APPLIED MATERIALS INC3 citations61
US10170280B2Jan 1, 2019
Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall
APPLIED MATERIALS INC0 citations51
CHANDRACHOOD MADHAVI R
2 patentsUS8202441B2Jun 19, 2012
Process for etching a metal layer suitable for use in photomask fabrication
CHANDRACHOOD MADHAVI R22 citations90
US9218944B2Dec 22, 2015
Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors
CHANDRACHOOD MADHAVI R15 citations82