Inventor

GRIMBERGEN MICHAEL N

US28 patents

⚠️ This page may combine multiple inventors who share the name “GRIMBERGEN MICHAEL N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GRIMBERGEN MICHAEL N

APPLIED MATERIALS INC

Chamber having process monitoring window

Chamber having improved process monitoring window

Endpoint detection for semiconductor processes

Endpoint detection in the fabrication of electronic devices

Substrate monitoring method and apparatus

Dual endpoint detection for advanced phase shift and binary photomasks

Ultra-stable, compact, high intensity fiber-coupled light source for use in monitoring and process control

Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside

Mask etch plasma reactor with cathode providing a uniform distribution of etch rate

Mask etch plasma reactor with variable process gas distribution

Plasma reactor for processing a workpiece and having a tunable cathode

Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another

Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator

Etch processing system having reflective endpoint detection

Etch processing system having reflective endpoint detection

Process for etching a transparent workpiece including backside endpoint detection steps

Plasma reactor with a dynamically adjustable plasma source power applicator

Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another

Adjustable achromatic collimator assembly for endpoint detection systems

Adjustable achromatic collimator assembly for endpoint detection systems

Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall

Phase shifting photomask and a method of fabricating thereof

GRIMBERGEN MICHAEL N

Inductively coupled plasma reactor having RF phase control and methods of use thereof

Etch rate detection for photomask etching

Methods for reducing photoresist interference when monitoring a target layer in a plasma process

(unassigned)

Reducing deposition of process residues on a surface in a chamber

CHANDRACHOOD MADHAVI R

Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors

OUYE ALAN H

Chamber lid heater ring assembly