Inventor
KOCH RENEE
US5 patents
Patents
5 patentsUS7520999B2Apr 21, 2009
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another
APPLIED MATERIALS INC16 citations83
US7504041B2Mar 17, 2009
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator
APPLIED MATERIALS INC13 citations83
US7431797B2Oct 7, 2008
Plasma reactor with a dynamically adjustable plasma source power applicator
APPLIED MATERIALS INC2 citations62
US7419551B2Sep 2, 2008
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another
APPLIED MATERIALS INC4 citations62
US7786019B2Aug 31, 2010
Multi-step photomask etching with chlorine for uniformity control
APPLIED MATERIALS INC3 citations57