Inventor
PANAYIL SHEEBA J
US14 patents
⚠️ This page may combine multiple inventors who share the name “PANAYIL SHEEBA J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
12 patentsUS7909961B2Mar 22, 2011
Method and apparatus for photomask plasma etching
APPLIED MATERIALS INC21 citations92
US8017029B2Sep 13, 2011
Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside
APPLIED MATERIALS INC7 citations83
US7976671B2Jul 12, 2011
Mask etch plasma reactor with variable process gas distribution
APPLIED MATERIALS INC20 citations83
US7943005B2May 17, 2011
Method and apparatus for photomask plasma etching
APPLIED MATERIALS INC15 citations83
US7520999B2Apr 21, 2009
Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another
APPLIED MATERIALS INC16 citations83
US7504041B2Mar 17, 2009
Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator
APPLIED MATERIALS INC13 citations83
US7335266B2Feb 26, 2008
Method of forming a controlled and uniform lightly phosphorous doped silicon film
APPLIED MATERIALS INC7 citations72
US6982214B2Jan 3, 2006
Method of forming a controlled and uniform lightly phosphorous doped silicon film
APPLIED MATERIALS INC7 citations72
US7431797B2Oct 7, 2008
Plasma reactor with a dynamically adjustable plasma source power applicator
APPLIED MATERIALS INC2 citations62
US7419551B2Sep 2, 2008
Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another
APPLIED MATERIALS INC4 citations62
US10170280B2Jan 1, 2019
Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall
APPLIED MATERIALS INC0 citations51
US7265036B2Sep 4, 2007
Deposition of nano-crystal silicon using a single wafer chamber
APPLIED MATERIALS INC0 citations47