Inventor

FRIJNS OLAV WALDEMAR VLADIMIR

NL20 patents

⚠️ This page may combine multiple inventors who share the name “FRIJNS OLAV WALDEMAR VLADIMIR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FRIJNS OLAV WALDEMAR VLADIMIR

ASML NETHERLANDS BV

Electron injector and free electron laser

Radiation source, lithographic apparatus and device manufacturing method

Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby

Source-collector device, lithographic apparatus, and device manufacturing method

Radiation system and lithographic apparatus comprising the same

Radioisotope production

Lithographic method

Lithographic method

Beam delivery apparatus and method

Radiation collector, radiation source and lithographic apparatus

Lithographic apparatus, device manufacturing method and radiation collector

Radiation system and lithographic apparatus comprising the same

Electron injector and free electron laser

Device arranged to measure a quantity relating to radiation and lithographic apparatus

FRIJNS OLAV WALDEMAR VLADIMIR

Correction of spatial instability of an EUV source by laser beam steering

Lithographic apparatus, a radiation system, a device manufacturing method and a radiation generating method

DONDERS SJOERD NICOLAAS LAMBERTUS

Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method

VAN SCHOOT JAN BERNARD PLECHELMUS

Radiation source

ASML HOLDING NV

Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris

YAKUNIN ANDREI MIKHAILOVICH

Grazing incidence reflectors, lithographic apparatus, methods for manufacturing a grazing incidence reflector and methods for manufacturing a device