Inventor
HASE USHIO
JP7 patents
Patents
7 patentsUS6286526B1Sep 11, 2001
Method for treatment of semiconductor substrate with chemical solution and apparatus used for said treatment
NEC CORP22 citations91
US6033459AMar 7, 2000
Gas collection apparatus, gas analyzing apparatus using the same and gas analyzing method
NEC CORP23 citations90
US5714676AFeb 3, 1998
Method and apparatus for analyzing gas components and apparatus for collecting sample gases
NEC CORP30 citations90
US6171975B1Jan 9, 2001
Wet-chemical treatment method, treatment method of semiconductor substrate, and manufacturing method of semiconductor device
NEC CORP29 citations89
US5841022ANov 24, 1998
Gas analyzer and gas analysis method
NEC CORP18 citations82
US6030844AFeb 29, 2000
Method and apparatus for pre-analyzing treatment for subsequent analysis of metal components in volatile alkali solution and non-volatile anion in volatine acid solution and method and apparatus for the subsequent analysis
NEC CORP5 citations60
US5516701AMay 14, 1996
Method for trace analysis of impurity, and light absorption measuring apparatus, measuring cell and aliquotting device used in the method
NEC CORP6 citations60