Inventor
INOMATA KATSUMI
JP15 patents
⚠️ This page may combine multiple inventors who share the name “INOMATA KATSUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
10 patentsUS7015256B2Mar 21, 2006
Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same
JSR CORP20 citations91
US7214454B2May 8, 2007
Positively photosensitive insulating resin composition and cured object obtained therefrom
JSR CORP12 citations83
US7265044B2Sep 4, 2007
Method for forming bump on electrode pad with use of double-layered film
JSR CORP12 citations82
US6048659AApr 11, 2000
Radiation-sensitive resin composition
JSR CORP6 citations73
US6007961ADec 28, 1999
Radiation-sensitive resin composition
JSR CORP12 citations73
US6171750B1Jan 9, 2001
Radiation-sensitive resin composition
JSR CORP10 citations68
US7371500B2May 13, 2008
Positive photosensitive insulating resin composition and cured product thereof
JSR CORP1 citations51
US7247420B2Jul 24, 2007
Two-layer film and method of forming pattern with the same
JSR CORP1 citations51
US8889557B2Nov 18, 2014
Substrate treating method, temporary fixing composition and semiconductor device
JSR CORP1 citations48
US10086583B2Oct 2, 2018
Stack, method for treating substrate material, temporary fixing composition, and semiconductor device
JSR CORP0 citations37
JAPAN SYNTHETIC RUBBER CO LTD
4 patentsUS5958645ASep 28, 1999
Radiation-sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD19 citations92
US5672459ASep 30, 1997
Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups
JAPAN SYNTHETIC RUBBER CO LTD3 citations62
US5798201AAug 25, 1998
Radiation sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD3 citations60
US5707558AJan 13, 1998
Radiation sensitive resin composition
JAPAN SYNTHETIC RUBBER CO LTD2 citations60