Inventor

ISHIZUKA SHUUICHI

JP6 patents

⚠️ This page may combine multiple inventors who share the name “ISHIZUKA SHUUICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

3 patents

US7674722B2Mar 9, 2010

Method of forming gate insulating film, semiconductor device and computer recording medium

TOKYO ELECTRON LTD11 citations83

US7695763B2Apr 13, 2010

Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate

TOKYO ELECTRON LTD6 citations72

US7842621B2Nov 30, 2010

Method of measuring nitrogen concentration, method of forming silicon oxynitride film, and method of manufacturing semiconductor device.

TOKYO ELECTRON LTD0 citations39

TAKATSUKI KOICHI

1 patent

US8394231B2Mar 12, 2013

Plasma process device and plasma process method

TAKATSUKI KOICHI3 citations57

TOYKO ELECTRON LTD

1 patent

US7915177B2Mar 29, 2011

Method of forming gate insulation film, semiconductor device, and computer recording medium

TOYKO ELECTRON LTD1 citations50

ISHIZUKA SHUUICHI

1 patent

US8608901B2Dec 17, 2013

Process chamber cleaning method in substrate processing apparatus, substrate processing apparatus, and substrate processing method

ISHIZUKA SHUUICHI1 citations45