P

Inventor

SASAKI MASARU

JP79 patents
⚠️ This page may combine multiple inventors who share the name “SASAKI MASARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

21 patents
US7771796B2Aug 10, 2010

Plasma processing method and film forming method

TOKYO ELECTRON LTD504 citations98
US7226874B2Jun 5, 2007

Substrate processing method

TOKYO ELECTRON LTD24 citations92
US8006640B2Aug 30, 2011

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD11 citations84
US7560396B2Jul 14, 2009

Material for electronic device and process for producing the same

TOKYO ELECTRON LTD10 citations84
US7524774B2Apr 28, 2009

Manufacturing method of semiconductor device, semiconductor manufacturing apparatus, plasma nitridation method, computer recording medium, and program

TOKYO ELECTRON LTD11 citations84
US7226848B2Jun 5, 2007

Substrate treating method and production method for semiconductor device

TOKYO ELECTRON LTD11 citations84
US7887637B2Feb 15, 2011

Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning

TOKYO ELECTRON LTD7 citations81
US7825018B2Nov 2, 2010

Plasma oxidation method and method for manufacturing semiconductor device

TOKYO ELECTRON LTD7 citations74
US7429539B2Sep 30, 2008

Nitriding method of gate oxide film

TOKYO ELECTRON LTD7 citations74
US7250375B2Jul 31, 2007

Substrate processing method and material for electronic device

TOKYO ELECTRON LTD9 citations74
US7232772B2Jun 19, 2007

Substrate processing method

TOKYO ELECTRON LTD7 citations74
US7695763B2Apr 13, 2010

Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate

TOKYO ELECTRON LTD6 citations72
US7981785B2Jul 19, 2011

Method for manufacturing semiconductor device and plasma oxidation method

TOKYO ELECTRON LTD3 citations63
US7906440B2Mar 15, 2011

Semiconductor device manufacturing method and plasma oxidation method

TOKYO ELECTRON LTD4 citations63
US7897009B2Mar 1, 2011

Plasma processing apparatus

TOKYO ELECTRON LTD2 citations63
US7811945B2Oct 12, 2010

Selective plasma processing method

TOKYO ELECTRON LTD6 citations63
US7517751B2Apr 14, 2009

Substrate treating method

TOKYO ELECTRON LTD2 citations63
US8021987B2Sep 20, 2011

Method of modifying insulating film

TOKYO ELECTRON LTD3 citations62
US7662236B2Feb 16, 2010

Method for forming insulation film

TOKYO ELECTRON LTD3 citations62
US7655574B2Feb 2, 2010

Method of modifying insulating film

TOKYO ELECTRON LTD3 citations62
US7622402B2Nov 24, 2009

Method for forming underlying insulation film

TOKYO ELECTRON LTD2 citations62

KOITO MFG CO LTD

9 patents

MITSUBISHI ELECTRIC CORP

5 patents

TOYOTA MOTOR CO LTD

4 patents

SASAKI MASARU

4 patents

ICHIKAWA SHINJI

2 patents

NAMIKI PRECISION JEWEL CO LTD

2 patents

SHIBAMURA ICHIRO

1 patent

HOKURIKU SEIKEI IND CO LTD

1 patent

KABE YOSHIRO

1 patent

Showing the top 50 of 79 patents by PatentIndex Score.