Inventor
LAYH MICHAEL
DE33 patents
⚠️ This page may combine multiple inventors who share the name “LAYH MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
16 patentsUS9599904B2Mar 21, 2017
Illumination system for illuminating a mask in a microlithographic exposure apparatus
ZEISS CARL SMT GMBH15 citations92
US9658533B2May 23, 2017
Arrangement of a mirror
ZEISS CARL SMT GMBH2 citations73
US10191382B2Jan 29, 2019
Illumination system for illuminating a mask in a microlithographic exposure apparatus
ZEISS CARL SMT GMBH1 citations72
US9310694B2Apr 12, 2016
Illumination system for illuminating a mask in a microlithographic exposure apparatus
ZEISS CARL SMT GMBH3 citations72
US10241416B2Mar 26, 2019
Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US9897925B2Feb 20, 2018
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US9239229B2Jan 19, 2016
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations62
US8786849B2Jul 22, 2014
Method for measuring an optical system
ZEISS CARL SMT GMBH2 citations61
US9217930B2Dec 22, 2015
Illumination system for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations60
US10146135B2Dec 4, 2018
Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
ZEISS CARL SMT GMBH0 citations52
US9019475B2Apr 28, 2015
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations52
US9001309B2Apr 7, 2015
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations52
US9977333B2May 22, 2018
Illumination system for illuminating a mask in a microlithographic exposure apparatus
ZEISS CARL SMT GMBH0 citations51
US9575414B2Feb 21, 2017
Illumination system for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH0 citations50
US9341953B2May 17, 2016
Microlithographic illumination system
ZEISS CARL SMT GMBH0 citations50
US9933704B2Apr 3, 2018
Microlithography illumination optical system and microlithography projection exposure apparatus including same
ZEISS CARL SMT GMBH0 citations42
LAYH MICHAEL
5 patentsUS9176390B2Nov 3, 2015
Method for adjusting an illumination system of a projection exposure apparatus for projection lithography
LAYH MICHAEL8 citations83
US9007559B2Apr 14, 2015
EUV collector with cooling device
LAYH MICHAEL4 citations72
US8724086B2May 13, 2014
Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation
LAYH MICHAEL4 citations72
US8891057B2Nov 18, 2014
Microlithographic projection exposure apparatus
LAYH MICHAEL2 citations61
US9304400B2Apr 5, 2016
Illumination system for EUV microlithography
LAYH MICHAEL0 citations39
XALTER STEFAN
2 patentsUS9013684B2Apr 21, 2015
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
XALTER STEFAN17 citations91
US8339577B2Dec 25, 2012
Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
XALTER STEFAN9 citations82