Inventor

DEGUENTHER MARKUS

DE110 patents

⚠️ This page may combine multiple inventors who share the name “DEGUENTHER MARKUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DEGUENTHER MARKUS

ZEISS CARL SMT GMBH

Illumination system for illuminating a mask in a microlithographic exposure apparatus

Illumination system for microlithography

Optical waveguide for guiding illumination light

Illumination optical unit for EUV projection lithography

Illumination system of a microlithographic projection exposure apparatus

Facet mirror for a projection exposure apparatus

Illumination system

Illumination optical unit for EUV projection lithography, and optical system comprising such an illumination optical unit

Method of operating a microlithographic projection apparatus and illumination system of such an apparatus

Illumination system for illuminating a mask in a microlithographic exposure apparatus

Lighting system of a microlithographic projection exposure system and method for operating such a lighting system

Optical hollow waveguide assembly

Illumination system for illuminating a mask in a microlithographic exposure apparatus

Illumination system of a microlithographic projection exposure apparatus

Measuring system for measuring an imaging quality of an EUV lens

Pupil facet mirror, illumination optics and optical system for a projection lithography system

Pupil facet mirror, illumination optics and optical system for a projection lithography system

Facet mirror for an illumination optical unit for projection lithography

Illumination apparatus for microlithography projection system including polarization-modulating optical element

Illumination system for a microlithographic projection exposure apparatus

Illumination optical device for projection lithography

Facet mirror

Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Illumination system of a microlithographic projection exposure apparatus

Illumination system of a microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Illumination system of a microlithographic projection exposure apparatus

FIOLKA DAMIAN

Polarization-modulating optical element

Illumination apparatus for microlithographyprojection system including polarization-modulating optical element

Polarization-modulating optical element

Polarization-modulating optical element

Polarization-modulating optical element

Polarization-modulating optical element

ZEISS CARL SMT AG

Optical beam transformation system and illumination system comprising an optical beam transformation system

Optical device with raster elements, and illumination system with the optical device

Device for adjusting the illumination dose on a photosensitive layer

DEGUENTHER MARKUS

Microlithographic illumination system

Microlithographic projection exposure apparatus

Illumination system of a microlithographic projection exposure apparatus

XALTER STEFAN

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

LAYH MICHAEL

Method for adjusting an illumination system of a projection exposure apparatus for projection lithography

Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation

PATRA MICHAEL

Illumination system of a microlithographic projection exposure apparatus

WANGLER JOHANNES

Illumination optical unit for projection lithography

SCHOLZ AXEL

Illumination system for microlithography

SCHUBERT ERICH

Illumination system for illuminating a mask in a microlithographic exposure apparatus

MULDER HEINE MELLE

Illumination system and lithographic apparatus

HOEGELE ARTUR

Illumination optics and projection exposure apparatus