Inventor

PATRA MICHAEL

DE71 patents

⚠️ This page may combine multiple inventors who share the name “PATRA MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PATRA MICHAEL

ZEISS CARL SMT GMBH

Illumination system for illuminating a mask in a microlithographic exposure apparatus

Optical system for a projection exposure apparatus

Illumination optical unit for EUV projection lithography

Illumination system of a microlithographic projection exposure apparatus

System for producing structures in a substrate

Facet mirror for a projection exposure apparatus

EUV light source for a lighting device of a microlithographic projection exposure apparatus

Method for assigning a pupil facet of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus to a field facet of a field facet mirror of the illumination optical unit

Illumination system of a microlithographic projection exposure apparatus

Illumination optical unit for EUV projection lithography, and optical system comprising such an illumination optical unit

Illumination optical unit for EUV projection lithography

Method of operating a microlithographic apparatus

Illumination system for illuminating a mask in a microlithographic exposure apparatus

Illumination system for illuminating a mask in a microlithographic exposure apparatus

Facet mirror for an illumination optical unit for projection lithography

Illumination optical unit for EUV projection lithography

Illumination system of a microlithographic projection exposure apparatus

EUV light source

Method for determining a position of a mirror

Stop for arrangement in a constriction of an EUV illumination beam

Illumination optic for projection lithography

Projection exposure method and projection exposure apparatus for microlithography

Projection exposure method and projection exposure apparatus for microlithography

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Illumination system of a microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Optical system for a lithographic projection exposure apparatus

Digital micromirror device for an illumination optical component of a projection exposure system

Optical system for transferring original structure portions of a lithography mask, projection optical unit for imaging an object field in which at least one original structure portion of the lithography mask is arrangeable, and lithography mask

Optical assembly for guiding an output beam of a free electron laser

Method for the microlithographic production of microstructured components

Illumination system for EUV projection lithography

Optical component for use in a radiation source module of a projection exposure system

Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation

Beam distributing optical device and associated unit, system and apparatus

Illumination system for EUV projection lithography

Illumination optical unit

Illumination system for an EUV projection lithographic projection exposure apparatus

Illumination optical unit for EUV projection lithography

Assembly for a projection exposure apparatus for EUV projection lithography

XALTER STEFAN

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

PATRA MICHAEL

Illumination system of a microlithographic projection exposure apparatus

Microlithographic projection exposure apparatus and related method

LAYH MICHAEL

Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation

Microlithographic projection exposure apparatus

CARL ZEISS SMART OPTICS GMBH

Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens

Spectacle lens for a display device that can be fitted on the head of a user and generates an image, and display device with such a spectacle lens

SCHUBERT ERICH

Illumination system for illuminating a mask in a microlithographic exposure apparatus

DEGUENTHER MARKUS

Microlithographic projection exposure apparatus