Inventor

WANGLER JOHANNES

DE83 patents

⚠️ This page may combine multiple inventors who share the name “WANGLER JOHANNES”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WANGLER JOHANNES

ZEISS CARL SMT AG

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm

Illumination system particularly for microlithography

Collector for an illumination system with a wavelength of less than or equal to 193 nm

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Illumination system for a microlithography projection exposure installation

Multi mirror system for an illumination system

Collector configured of mirror shells

Collector with fastening devices for fastening mirror shells

Collector having unused region for illumination systems using a wavelength ≦193 nm

Multi mirror system for an illumination system

Optical device with raster elements, and illumination system with the optical device

Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Zoom system for an illumination device

Illumination system with a plurality of individual gratings

Partial objective in an illuminating systems

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Lithography lens system and projection exposure system provided with at least one lithography lens system of this type

Collector with fastening devices for fastening mirror shells

Illumination system with field mirrors for producing uniform scanning energy

ZEISS STIFTUNG

Illumination system particularly for microlithography

Illumination system particularly for EUV lithography

Illuminating arrangement including a zoom objective incorporating two axicons

Illuminating system of a microlithographic projection exposure arrangement

Illuminating arrangement for a projection microlithographic apparatus

Illumination system, particularly for EUV lithography

Illuminating system for vacuum ultraviolet microlithography

Arrangement for shaping a laser beam and for reducing the coherence thereof

Reticular objective for microlithography-projection exposure installations

Illuminating arrangement for an optical system having a reticle masking unit

REMA objective for microlithographic projection exposure systems

Illuminating arrangement for a projection microlithographic exposure apparatus

Projection-microlithographic device

XALTER STEFAN

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

ZEISS CARL SMT GMBH

Illumination system particularly for microlithography

Illumination optical unit for EUV projection lithography

ZEISS CARL SEMICONDUCTOR MFG

Illumination system particularly for microlithography

Optical integrator for an illumination device

CARL ZEISS STIFTUNG TRADING

Illumination system, particularly for EUV lithography

CARL ZEISS SEMICONDUCTOR

Illumination system particularly for microlithography

ZEISS CARL

Illumination system and REMA objective with lens displacement and operating process therefor

WANGLER JOHANNES

Illumination optical unit for projection lithography

LAYH MICHAEL

Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation

ASML LITHOGRAPHY B V

Illumination system that suppresses debris from a light source