Inventor
GOLD EZRA ROBERT
US23 patents
⚠️ This page may combine multiple inventors who share the name “GOLD EZRA ROBERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
14 patentsUS7846497B2Dec 7, 2010
Method and apparatus for controlling gas flow to a processing chamber
APPLIED MATERIALS INC37 citations90
US7775236B2Aug 17, 2010
Method and apparatus for controlling gas flow to a processing chamber
APPLIED MATERIALS INC25 citations90
US7540971B2Jun 2, 2009
Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of gas content
APPLIED MATERIALS INC16 citations84
US7541292B2Jun 2, 2009
Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones
APPLIED MATERIALS INC12 citations84
US7431859B2Oct 7, 2008
Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation
APPLIED MATERIALS INC18 citations84
US7975558B2Jul 12, 2011
Method and apparatus for gas flow measurement
APPLIED MATERIALS INC9 citations83
US7743670B2Jun 29, 2010
Method and apparatus for gas flow measurement
APPLIED MATERIALS INC10 citations83
US8895889B2Nov 25, 2014
Methods and apparatus for rapidly responsive heat control in plasma processing devices
APPLIED MATERIALS INC2 citations63
US7901952B2Mar 8, 2011
Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters
APPLIED MATERIALS INC2 citations63
US7452824B2Nov 18, 2008
Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
APPLIED MATERIALS INC3 citations63
US9587789B2Mar 7, 2017
Methods and apparatus for providing a gas mixture to a pair of process chambers
APPLIED MATERIALS INC0 citations52
US7910013B2Mar 22, 2011
Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
APPLIED MATERIALS INC0 citations52
US7470626B2Dec 30, 2008
Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
APPLIED MATERIALS INC1 citations52
US7795153B2Sep 14, 2010
Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters
APPLIED MATERIALS INC0 citations42