Inventor
LIU CHI-JEN
TW42 patents
⚠️ This page may combine multiple inventors who share the name “LIU CHI-JEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
37 patentsUS9917173B2Mar 13, 2018
Oxidation and etching post metal gate CMP
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US9564511B2Feb 7, 2017
Oxidation and etching post metal gate CMP
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9076766B2Jul 7, 2015
Mechanism for forming metal gate structure
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US9449841B2Sep 20, 2016
Methods and systems for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations83
US9768064B1Sep 19, 2017
Formation method of semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US11482450B2Oct 25, 2022
Methods of forming an abrasive slurry and methods for chemical- mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10937691B2Mar 2, 2021
Methods of forming an abrasive slurry and methods for chemical-mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US12359090B2Jul 15, 2025
Composition and method for polishing and integrated circuit
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12224179B2Feb 11, 2025
Metal heterojunction structure with capping metal layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11996283B2May 28, 2024
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11637021B2Apr 25, 2023
Metal heterojunction structure with capping metal layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11633829B2Apr 25, 2023
External heating system for use in chemical mechanical polishing system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11410846B2Aug 9, 2022
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11094555B2Aug 17, 2021
CMP slurry and CMP method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11037799B2Jun 15, 2021
Metal heterojunction structure with capping metal layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12550695B2Feb 10, 2026
Methods of forming an abrasive slurry and methods for chemical-mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12486479B2Dec 2, 2025
Semiconductor device cleaning solution, method of use, and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12297375B2May 13, 2025
Slurry composition and method for polishing and integrated circuit
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12131944B2Oct 29, 2024
Slurry composition, semiconductor structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11773353B2Oct 3, 2023
Semiconductor device cleaning solution, method of use, and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11121028B2Sep 14, 2021
Semiconductor devices formed using multiple planarization processes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11114339B2Sep 7, 2021
Method for reducing metal plug corrosion and device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10961487B2Mar 30, 2021
Semiconductor device cleaning solution, method of use, and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10510601B2Dec 17, 2019
Method for reducing metal plug corrosion and device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US12002684B2Jun 4, 2024
Methods for chemical mechanical polishing and forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11658065B2May 23, 2023
Chemical mechanical polishing slurry composition, method for chemical mechanical polishing and method for forming connecting structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11508585B2Nov 22, 2022
Methods for chemical mechanical polishing and forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US9553161B2Jan 24, 2017
Mechanism for forming metal gate structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11133247B2Sep 28, 2021
Vias with metal caps for underlying conductive lines
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10847359B2Nov 24, 2020
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10755934B2Aug 25, 2020
Systems and methods for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10692732B2Jun 23, 2020
CMP slurry and CMP method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10515808B2Dec 24, 2019
Systems and methods for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10157781B2Dec 18, 2018
Method for forming semiconductor structure using polishing process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9633832B2Apr 25, 2017
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12347735B2Jul 1, 2025
In-situ defect count detection in post chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50
US10636701B2Apr 28, 2020
Methods of forming semiconductor devices using multiple planarization processes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50