Inventor
WU LI-CHIEH
TW33 patents
⚠️ This page may combine multiple inventors who share the name “WU LI-CHIEH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
31 patentsUS9917173B2Mar 13, 2018
Oxidation and etching post metal gate CMP
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US9859165B1Jan 2, 2018
Planarization process for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US9564511B2Feb 7, 2017
Oxidation and etching post metal gate CMP
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9076766B2Jul 7, 2015
Mechanism for forming metal gate structure
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US9449841B2Sep 20, 2016
Methods and systems for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations83
US11482450B2Oct 25, 2022
Methods of forming an abrasive slurry and methods for chemical- mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US11211289B2Dec 28, 2021
Metal loss prevention using implantation
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10937691B2Mar 2, 2021
Methods of forming an abrasive slurry and methods for chemical-mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10643892B2May 5, 2020
Metal loss prevention using implantation
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10109523B2Oct 23, 2018
Method of cleaning wafer after CMP
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12068195B2Aug 20, 2024
Metal loss prevention using implantation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11996283B2May 28, 2024
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11710659B2Jul 25, 2023
Metal loss prevention using implantation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11410846B2Aug 9, 2022
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12550695B2Feb 10, 2026
Methods of forming an abrasive slurry and methods for chemical-mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12506034B2Dec 23, 2025
Polishing interconnect structures in semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12297375B2May 13, 2025
Slurry composition and method for polishing and integrated circuit
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11978664B2May 7, 2024
Polishing interconnect structures in semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11532514B2Dec 20, 2022
Structure and formation method of semiconductor device with conductive feature
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11430691B2Aug 30, 2022
Polishing interconnect structures in semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10957587B2Mar 23, 2021
Structure and formation method of semiconductor device with conductive feature
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10916473B2Feb 9, 2021
Method of cleaning wafer after CMP
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12002684B2Jun 4, 2024
Methods for chemical mechanical polishing and forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11658065B2May 23, 2023
Chemical mechanical polishing slurry composition, method for chemical mechanical polishing and method for forming connecting structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11508585B2Nov 22, 2022
Methods for chemical mechanical polishing and forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US9553161B2Jan 24, 2017
Mechanism for forming metal gate structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10847359B2Nov 24, 2020
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10755934B2Aug 25, 2020
Systems and methods for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10515808B2Dec 24, 2019
Systems and methods for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9633832B2Apr 25, 2017
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10510594B2Dec 17, 2019
Method of cleaning wafer after CMP
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50