Inventor
SUEN SHICH-CHANG
TW33 patents
⚠️ This page may combine multiple inventors who share the name “SUEN SHICH-CHANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
29 patentsUS9630295B2Apr 25, 2017
Mechanisms for removing debris from polishing pad
TAIWAN SEMICONDUCTOR MFG CO LTD25 citations93
US10504782B2Dec 10, 2019
Fin Field-Effect Transistor device and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US9987720B2Jun 5, 2018
Method for operating a polishing head and method for polishing a substrate
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US9917173B2Mar 13, 2018
Oxidation and etching post metal gate CMP
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US9564511B2Feb 7, 2017
Oxidation and etching post metal gate CMP
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9352443B2May 31, 2016
Platen assembly, chemical-mechanical polisher, and method for polishing substrate
TAIWAN SEMICONDUCTOR MFG CO LTD16 citations84
US9076766B2Jul 7, 2015
Mechanism for forming metal gate structure
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10164053B1Dec 25, 2018
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD18 citations83
US9449841B2Sep 20, 2016
Methods and systems for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations83
US11024540B2Jun 1, 2021
Fin field-effect transistor device and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10967478B2Apr 6, 2021
Chemical mechanical polishing apparatus and method
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9272386B2Mar 1, 2016
Polishing head, and chemical-mechanical polishing system for polishing substrate
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9802292B2Oct 31, 2017
Advanced polishing system
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations67
US12325102B2Jun 10, 2025
Chemical mechanical polishing apparatus and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11996283B2May 28, 2024
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11728215B2Aug 15, 2023
Fin Field-Effect Transistor device and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11718812B2Aug 8, 2023
Post-CMP cleaning composition for germanium-containing substrate
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11410846B2Aug 9, 2022
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11117239B2Sep 14, 2021
Chemical mechanical polishing composition and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12508685B2Dec 30, 2025
Semiconductor device fabrication methods and devices for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12581915B2Mar 17, 2026
Apparatus and methods for chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations57
US9553161B2Jan 24, 2017
Mechanism for forming metal gate structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US12447580B2Oct 21, 2025
Apparatus and methods for chemical mechanical polishing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12427618B2Sep 30, 2025
Chemical-mechanical planarization pad and methods of use
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10847359B2Nov 24, 2020
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10755934B2Aug 25, 2020
Systems and methods for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10515808B2Dec 24, 2019
Systems and methods for chemical mechanical polish and clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9633832B2Apr 25, 2017
Method for metal gate surface clean
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10160088B2Dec 25, 2018
Advanced polishing system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations46