Inventor
TIEN BOR-ZEN
TW41 patents
⚠️ This page may combine multiple inventors who share the name “TIEN BOR-ZEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
32 patentsUS9184087B2Nov 10, 2015
Mechanisms for forming FinFETs with different fin heights
TAIWAN SEMICONDUCTOR MFG CO LTD12 citations92
US10515902B2Dec 24, 2019
Back-end-of-line (BEOL) arrangement with multi-height interlayer dielectric (ILD) structures
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations83
US9349688B2May 24, 2016
Systems and methods to enhance passivation integrity
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US9076804B2Jul 7, 2015
Systems and methods to enhance passivation integrity
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations83
US9412866B2Aug 9, 2016
BEOL selectivity stress film
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations82
US11101360B2Aug 24, 2021
Method of manufacturing a semiconductor device and a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9559011B2Jan 31, 2017
Mechanisms for forming FinFETs with different fin heights
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9122828B2Sep 1, 2015
Apparatus and method for designing an integrated circuit layout having a plurality of cell technologies
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations73
US11621343B2Apr 4, 2023
Method of manufacturing semiconductor devices and semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10957653B2Mar 23, 2021
Methods for manufacturing semiconductor arrangements using photoresist masks
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9870998B2Jan 16, 2018
Semiconductor arrangement having an overlay alignment mark with a height shorter than a neighboring gate structure
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US9070687B2Jun 30, 2015
Semiconductor device with self-protecting fuse
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations71
US11075269B2Jul 27, 2021
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations68
US10134626B2Nov 20, 2018
Mechanisms for forming FinFETs with different fin heights
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US9842761B2Dec 12, 2017
Mechanisms for forming FinFETs with different fin heights
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations63
US12040381B2Jul 16, 2024
Method of manufacturing semiconductor devices and semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11069791B2Jul 20, 2021
Method of manufacturing semiconductor devices and semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11011419B2May 18, 2021
Method for forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US11990510B2May 21, 2024
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US10347766B2Jul 9, 2019
Semiconductor device and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9508590B2Nov 29, 2016
Methods and apparatus of metal gate transistors
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US10777480B2Sep 15, 2020
Systems and methods to enhance passivation integrity
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10515866B2Dec 24, 2019
Systems and methods to enhance passivation integrity
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10157810B2Dec 18, 2018
Systems and methods to enhance passivation integrity
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10014251B2Jul 3, 2018
Semiconductor device with self-protecting fuse and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9773716B2Sep 26, 2017
Systems and methods to enhance passivation integrity
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9299621B2Mar 29, 2016
Smart measurement techniques to enhance inline process control stability
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9299658B2Mar 29, 2016
Semiconductor device with self-protecting fuse and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9093373B2Jul 28, 2015
Conductive diffusion barrier structure for ohmic contacts
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9093528B2Jul 28, 2015
Stress compensation layer to improve device uniformity
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10629481B2Apr 21, 2020
Method for forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
US9716034B2Jul 25, 2017
Method for forming interconnect structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations48
TAIWAN SEMICONDUCTOR MFG
8 patentsUS6294448B1Sep 25, 2001
Method to improve TiSix salicide formation
TAIWAN SEMICONDUCTOR MFG31 citations92
US6346449B1Feb 12, 2002
Non-distort spacer profile during subsequent processing
TAIWAN SEMICONDUCTOR MFG13 citations74
US9178066B2Nov 3, 2015
Methods for forming a semiconductor arrangement with structures having different heights
TAIWAN SEMICONDUCTOR MFG2 citations62
US6284611B1Sep 4, 2001
Method for salicide process using a titanium nitride barrier layer
TAIWAN SEMICONDUCTOR MFG6 citations61
US7998772B2Aug 16, 2011
Method to reduce leakage in a protection diode structure
TAIWAN SEMICONDUCTOR MFG3 citations59
US7663164B2Feb 16, 2010
Semiconductor device with reduced leakage protection diode
TAIWAN SEMICONDUCTOR MFG3 citations59
US9190319B2Nov 17, 2015
Method for forming interconnect structure
TAIWAN SEMICONDUCTOR MFG0 citations48
US8860151B2Oct 14, 2014
Semiconductor device having a spacer and a liner overlying a sidewall of a gate structure and method of forming the same
TAIWAN SEMICONDUCTOR MFG0 citations47