Inventor

AKIMARU HISANORI

JP2 patents

Patents

2 patents

US9417522B2Aug 16, 2016

Photosensitive resin composition and method for producing resist pattern

JSR CORP2 citations52

US10095110B2Oct 9, 2018

Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern

JSR CORP0 citations43